Electrodeposition and corrosion behaviour of a Ni–W–B amorphous alloy

Authors: Santana, R.; Prasad, S.; Campos, A.; Araújo, F.; Silva, G.; Lima-Neto, P.

Source: Journal of Applied Electrochemistry, Volume 36, Number 1, January 2006 , pp. 105-113(9)

Publisher: Springer

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Abstract:

Electrodeposition of Ni–W–B alloys from plating baths containing ammonia and citrate is reported. Optimum conditions for plating including current density, temperature, mechanical agitation and pH were studied. The corrosion resistance and amorphous character were also evaluated. The operational conditions for depositing the alloy with good corrosion resistance were: current density 35 mA cm⁻², bath temperature 40 °C, pH 9.0 and cathode rotation at 90 rpm. The alloy was deposited at 38% current efficiency, with an average composition of 73 wt% Ni, 27 wt% W and traces of boron and with E _corr −0.300 V and R _p 3.369×10⁴ Ω. The deposit obtained under these conditions had an amorphous character with the presence of some microcracks on its surface reaching down to the copper substrate. Electrochemical corrosion tests verified that the Ni–W–B alloy had better corrosion resistance than Co–W–B.

Keywords: alloy electrodeposition; amorphous structures; corrosion; electrodeposited films; Ni–W–B alloy

Document Type: Research article

DOI: http://dx.doi.org/10.1007/s10800-005-9046-2

Affiliations: 1: Email: prasad@deq.ufcg.edu.br

Publication date: 2006-01-01