Optimization of STM/FIM nanotip aspect ratio based on the Taguchi method
Source: The International Journal of Advanced Manufacturing Technology, Volume 44, Numbers 1-2, September 2009 , pp. 80-90(11)
Abstract:This paper presents optimization of electrochemical etching parameters to achieve the optimum aspect ratio of the scanning tunneling microscopy/field ion microscopy tungsten nanotip by using Taguchi method. The combination of optimum level of process parameters was obtained by using the analysis of signal-to-noise ratio. The level of importance of the process parameters on the nanotip aspect ratio was determined by using analysis of variance. It was found that the optimum level of process parameters are electrolyte concentration of 2 M/lit, wire immersion length of 2.5 mm, cathode tube inner diameter of 40 mm, and voltage of 3.5 V. Within the range of experiments and the process parameters in terms of impact significance were found to be electrolyte concentration, process voltage, wire immersion length, and inner diameter of cathode tube, respectively. By using the optimum level of the process parameters, the nanotip aspect ratio was enhanced by 263% in comparison to the mean value of the experimental results. The nanotip aspect ratio of up to 163:1 was obtained in the present research.
Document Type: Research Article
Affiliations: 1: Mechanical Engineering Department, Tarbiat Modares University, Tehran, Iran 2: Electrical Engineering Department, Tarbiat Modares University, Tehran, Iran 3: Mechanical Engineering Department, Amirkabir University of Technology, Tehran, Iran, Email: firstname.lastname@example.org
Publication date: 2009-09-01