Characterization of multilayer pvd nanocoatings deposited on tungsten carbide cutting tools

Authors: Kumar, C.1; Nair, P.2; Ramamoorthy, B.3

Source: The International Journal of Advanced Manufacturing Technology, Volume 38, Numbers 5-6, August 2008 , pp. 622-629(8)

Publisher: Springer

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Abstract:

The present trends in the coating technologies are gradient coatings, metastable coatings, multicomponaent coatings and multilayer or super lattice coatings. The physical vapour deposition (PVD) process is well-suited technology for these advanced coating technologies. The performance of the coated tools can be improved considerably using multi-layer micro and nanocoatings. The present paper discusses the deposition and characterization of multilayer TiN/Al2O3 coatings on cemented tungsten carbide cutting tools using reactive sputtering. The characterization of the coatings was carried out using X-ray diffraction (XRD) for phase analysis, chemical composition using EDAX, adhesion and toughness evaluation using Rockwell indentation test and surface roughness. It was observed that with decrease in thickness of each alumina layer to nanolevel in multilayer coating system results considerable improvement in final surface finish, adhesion and toughness of the coating. The experimental results are presented and analyzed in this paper.

Keywords: Multilayer coatings; Physical vapour deposition; Sputtering

Document Type: Research Article

DOI: http://dx.doi.org/10.1007/s00170-007-1059-z

Affiliations: 1: Department of Mechanical Engineering, Indian Institute of Technology Madras, Chennai, 600 036, India 2: Department of Metallurgical Engineering, Indian Institute of Technology Madras, Chennai, 600 036, India 3: Department of Mechanical Engineering, Indian Institute of Technology Madras, Chennai, 600 036, India, Email: ramoo@iitm.ac.in

Publication date: August 1, 2008

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