Scaling law of anomalous Hall effect in Fe/Cu bilayers

Authors: Xu, W.1; Zhang, B.1; Wang, Z.1; Chu, S.1; Li, W.1; Wu, Z.2; Yu, R.2; Zhang, X.3

Source: The European Physical Journal B - Condensed Matter, Volume 65, Number 2, September 2008 , pp. 233-237(5)

Publisher: Springer

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Abstract:

The scaling of anomalous Hall resistivity on longitudinal resistivity has been intensively studied in different magnetic systems, including multilayer and granular films, to examine whether a skew scattering or a side jump mechanism dominates in the origin of anomalous Hall effect (AHE). The scaling law is based on the premise that both resistivities are a consequence of electron scattering by the imperfections in the materials. By studying the anomalous Hall effect in the simple Fe/Cu bilayers, it was demonstrated that the measured anomalous Hall effect should not follow the scaling laws derived from skew scattering or side jump mechanism due to the short-circuit and shunting effects of the non-magnetic layers.

Keywords: 72.15.-v Electronic conduction in metals and alloys; 72.15.Gd Galvanomagnetic and other magnetotransport effects; 81.15.Cd Deposition by sputtering

Document Type: Research Article

DOI: http://dx.doi.org/10.1140/epjb/e2008-00350-3

Affiliations: 1: Departement of Physics and Institute of Nanoscience & Technology, The Hong Kong University of Science and Technology, Clear Water Bay, Kowloon, Hong Kong, P.R. China 2: Laboratory of Advanced Materials, Department of Materials Science and Engineering, Tsinghua University, Beijing, 100084, P.R. China 3: Departement of Physics and Institute of Nanoscience & Technology, The Hong Kong University of Science and Technology, Clear Water Bay, Kowloon, Hong Kong, P.R. China, Email: phxxz@ust.hk

Publication date: September 1, 2008

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