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Industrial printed Seed-Layer for Front Side Metallization of Crystalline Silicon Solar Cells

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An industrial scale ink-jet and light induced plating (LIP) based front side metallization process for crystalline silicon solar cells is presented. Via Schmid ink-jet printer “NanoJet” a < 1μm thin seed layer is printed that opens the isolating SiNx antireflective layer and creates a metal contact from cell surface to cell by burn-in in a high temperature furnace. Via LIP, a highly conductive silver layer is grown on the printed areas.

Following this strategy, fine finger lines with a width of 30-35μm after printing and 50-55μm after plating on mono- and poly-crystalline silicon cells were deposited. This lead to a 20% reduction of silver consumption and a gain of 0.3%abs of cell efficiency compared to standard screen printing process.
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Document Type: Research Article

Publication date: 01 January 2013

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  • For more than 30 years, IS&T's series of digital printing conferences have been the leading forum for discussion of advances and new directions in 2D and 3D printing technologies. A comprehensive, industry-wide conference that brings together industry and academia, this meeting includes all aspects of the hardware, materials, software, images, and applications associated with digital printing systems?particularly those involved with additive manufacturing and fabrication?including bio-printing, printed electronics, page-wide, drop-on-demand, desktop and continuous ink jet, toner-based systems, and production digital printing, as well as the engineering capability, optimization, and science involved in these fields. In 2016, the conference changed its name formally to Printing for Fabrication to better reflect the content of the meeting and the evolving technology of printing.

    Please note: For purposes of its Digital Library content, IS&T defines Open Access as papers that will be downloadable in their entirety for free in perpetuity. Copyright restrictions on papers vary; see individual paper for details.

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