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Industrial printed Seed-Layer for Front Side Metallization of Crystalline Silicon Solar Cells

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An industrial scale ink-jet and light induced plating (LIP) based front side metallization process for crystalline silicon solar cells is presented. Via Schmid ink-jet printer “NanoJet” a < 1μm thin seed layer is printed that opens the isolating SiNx antireflective layer and creates a metal contact from cell surface to cell by burn-in in a high temperature furnace. Via LIP, a highly conductive silver layer is grown on the printed areas.

Following this strategy, fine finger lines with a width of 30-35μm after printing and 50-55μm after plating on mono- and poly-crystalline silicon cells were deposited. This lead to a 20% reduction of silver consumption and a gain of 0.3%abs of cell efficiency compared to standard screen printing process.

Document Type: Research Article

Publication date: 2013-01-01

More about this publication?
  • For more than 25 years, NIP has been the leading forum for discussion of advances and new directions in non-impact and digital printing technologies. A comprehensive, industry-wide conference, this meeting includes all aspects of the hardware, materials, software, images, and applications associated with digital printing systems, including drop-on-demand ink jet, wide format ink jet, desktop and continuous ink jet, toner-based electrophotographic printers, production digital printing systems, and thermal printing systems, as well as the engineering capability, optimization, and science involved in these fields.

    Since 2005, NIP has been held in conjunction with the Digital Fabrication Conference.

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