New Submicron Silica Produced by the Fumed Process
Abstract:Submicron silicas produced by fumed processes and their corresponding surface-modified counterparts are compared with respect to their applicability as external additives for electrophotographic toners. The principal metric for comparison is tribo-electrostatic charge (T-ESC) stability under extended activation periods. Experimental samples are surface-modified submicron silicas produced by a fumed process. These materials have sufficient hydrophobicity and can work as spacer particles to prevent the embedding of small particle size external additives. This spacer-attribute thereby eliminates problems with charge stability and flowability, especially under extreme environmental conditions, that can impact toner performance.
Document Type: Research Article
Publication date: January 1, 2012
For more than 25 years, NIP has been the leading forum for discussion of advances and new directions in non-impact and digital printing technologies. A comprehensive, industry-wide conference, this meeting includes all aspects of the hardware, materials, software, images, and applications associated with digital printing systems, including drop-on-demand ink jet, wide format ink jet, desktop and continuous ink jet, toner-based electrophotographic printers, production digital printing systems, and thermal printing systems, as well as the engineering capability, optimization, and science involved in these fields.
Since 2005, NIP has been held in conjunction with the Digital Fabrication Conference.
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