Direct Etch through SiNx, Selective Dope, and Seed Layer Dispense with Inert Piezoelectric Inkjet Print Head for Solar Cell Fabrication
Abstract:The solar photovoltaic industry is driven towards increasing cell efficiency while reducing cost. Ink jet process offers an attractive, non-contact method enabling reduced capital equipment cost, fewer process steps and higher throughput. This study focuses on inkjet processes development of directly etching through a Silicon Nitride layer (anti-reflection layer), selectively doping and precisely dispensing a seed layer, also their combination at a shot to prepare for conventional screen printing afterwards or for low cost electroplating for the “selectiveemitter” solar cell fabrication.
Document Type: Research Article
Publication date: January 1, 2012
For more than 25 years, NIP has been the leading forum for discussion of advances and new directions in non-impact and digital printing technologies. A comprehensive, industry-wide conference, this meeting includes all aspects of the hardware, materials, software, images, and applications associated with digital printing systems, including drop-on-demand ink jet, wide format ink jet, desktop and continuous ink jet, toner-based electrophotographic printers, production digital printing systems, and thermal printing systems, as well as the engineering capability, optimization, and science involved in these fields.
Since 2005, NIP has been held in conjunction with the Digital Fabrication Conference.
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