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Using Hotmelt-Inkjet as a structuring method for higher efficiency industrial silicon solar cells

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A procedure was developed to form openings in dielectric layers for subsequent contact formation based on inkjetting hydrocarbon wax. Basic investigations on the process focussing on obtaining the minimal feature size are presented.

Continuous fine line openings below 20 μm width in the mask were obtained, which allowed for wet chemical etching of the underlying anti-reflective coatings. Subsequently nickel and Silver plating were used to form ohmic contacts, leading to a width of the metallization of down to about 30 μm. The results were achieved on micro-structured silicon surfaces covered by a silicon nitride layer commonly used in the photovoltaic industry.
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Document Type: Research Article

Publication date: 2008-01-01

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  • For more than 30 years, IS&T's series of digital printing conferences have been the leading forum for discussion of advances and new directions in 2D and 3D printing technologies. A comprehensive, industry-wide conference that brings together industry and academia, this meeting includes all aspects of the hardware, materials, software, images, and applications associated with digital printing systems?particularly those involved with additive manufacturing and fabrication?including bio-printing, printed electronics, page-wide, drop-on-demand, desktop and continuous ink jet, toner-based systems, and production digital printing, as well as the engineering capability, optimization, and science involved in these fields. In 2016, the conference changed its name formally to Printing for Fabrication to better reflect the content of the meeting and the evolving technology of printing.

    Please note: For purposes of its Digital Library content, IS&T defines Open Access as papers that will be downloadable in their entirety for free in perpetuity. Copyright restrictions on papers vary; see individual paper for details.

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