Near-Field Scanning Optical Nanolithography with Surface-Wave Enhanced Probes

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Abstract:

An optical approach to nano-patterning using near field scanning optical microscopy (NSOM) is presented. Using an NSOM specifically designed for patterning 4 inch wafers, we have demonstrated sub-100 nm feature sizes in conventional i-line photoresists, optical patterning of a-Si:H based resists, and patterning over large distances without stitching errors. A series of test structures were also fabricated including quantum point contacts and micro crystallite arrays. Novel NSOM probes based on excitation of surface plasmon polaritons are also being explored. The higher throughput and lower damage threshold possible with this approach suggests a significant increase in write speed over conventional NSOM probes can be achieved.

Document Type: Research Article

Publication date: January 1, 2006

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  • For more than 25 years, NIP has been the leading forum for discussion of advances and new directions in non-impact and digital printing technologies. A comprehensive, industry-wide conference, this meeting includes all aspects of the hardware, materials, software, images, and applications associated with digital printing systems, including drop-on-demand ink jet, wide format ink jet, desktop and continuous ink jet, toner-based electrophotographic printers, production digital printing systems, and thermal printing systems, as well as the engineering capability, optimization, and science involved in these fields.

    Since 2005, NIP has been held in conjunction with the Digital Fabrication Conference.

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