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Fabrication of Highly Resolution Colloidal Crystal Array on Patterned Substrates by Ink-Jet Printing

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Abstract:

Self-assembled colloidal patterns have been fabricated on a substrate using inkjet printing with an ink of submicron-sized monodisperse silica particles. The ink are prepared with welldispersed suspension of monodisperse silica particles. Dot patterns are formed on both hydrophilic silicon wafer and hydrophobic silicon wafer modified with octadecyltrichlorosilane. It was found that the uniformity and spatial extent of the self-assembly within a dot were significantly influenced by the interaction of the ink with substrates and its drying behavior. For the improvement of pattern resolution, we treat a silicon wafer with OTS by a contact-printing. Chemically heterogeneous substrate has repeated stripe patterns of hydrophilic and hydrophobic properties with different relative widths. When jetting conditions are well controlled, we demonstrate to directly print the line pattern with the width of 21 μm, which is difficult to achieve by the conventional ink-jet printing. The internal and external structures of the colloidal aggregates were observed by scanning electron microscope (SEM) and confocal microscopy.

Document Type: Research Article

Publication date: January 1, 2005

More about this publication?
  • For more than 25 years, NIP has been the leading forum for discussion of advances and new directions in non-impact and digital printing technologies. A comprehensive, industry-wide conference, this meeting includes all aspects of the hardware, materials, software, images, and applications associated with digital printing systems, including drop-on-demand ink jet, wide format ink jet, desktop and continuous ink jet, toner-based electrophotographic printers, production digital printing systems, and thermal printing systems, as well as the engineering capability, optimization, and science involved in these fields.

    Since 2005, NIP has been held in conjunction with the Digital Fabrication Conference.

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