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Photochemical Machining by Ink Jet. A Revolution in the Making?

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Abstract:

Ink jet (IJ) printing has advanced to a point where etch resist imaging can be achieved at the required resolution for many segments of the photochemical machining (PCM) or chemical milling industry. This advance together with the development of suitable etch resist inks for this application has made it possible for the introduction of IJ printing in commercial PCM manufacturing environments. This paper describes attributes that affect the IJ printed resist resolution, novel inks suitable for jetting, the advantages that are gained and the resist performance obtained.

Document Type: Research Article

Publication date: January 1, 2004

More about this publication?
  • For more than 25 years, NIP has been the leading forum for discussion of advances and new directions in non-impact and digital printing technologies. A comprehensive, industry-wide conference, this meeting includes all aspects of the hardware, materials, software, images, and applications associated with digital printing systems, including drop-on-demand ink jet, wide format ink jet, desktop and continuous ink jet, toner-based electrophotographic printers, production digital printing systems, and thermal printing systems, as well as the engineering capability, optimization, and science involved in these fields.

    Since 2005, NIP has been held in conjunction with the Digital Fabrication Conference.

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