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Sensitization by Formate Ions Doped at Different Depths in Silver Bromide Microcrystals

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In a double-jet apparatus controlled by a microcomputer, a series of formate doping emulsions of cubic AgBr grains in which formate ions were doped at different sites were prepared when a certain volume of sodium formate solution was injected into the emulsifying solution at different time intervals after the beginning of precipitation at a constant PAg. The sensitometric results from these formate doped emulsions showed: (1) that there were great differences in sensitivity between the emulsions that the same quantity of formate ions were doped at different sites of grains; (2) that relative sensitivity of doping emulsions to the corresponding undoping ones monotonically increased as the formate ions were moved closer to surface of grains; (3) that a cooperative sensitization by doping formate ions, S+Au and dye could be carried out to make a higher level of sensitivity possible without a significant increase in fog density; (4) that the formate ions doped inside AgBr grains were able to trap holes produced in dye aggregates adsorbed on the surface of grains, moreover, the closer to surface the doping ions were, the greater a sensitivity gain was.

Document Type: Research Article


Affiliations: 1: Technical Institute of Physics and Chemistry, The Chinese Academy of Sciences, Beijing, China and Graduate School of the Chinese Academy of Sciences, Beijing, China 2: Technical Institute of Physics and Chemistry, The Chinese Academy of Sciences, Beijing, China

Publication date: July 1, 2006

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  • The Journal of Imaging Science and Technology (JIST) is dedicated to the advancement of imaging science knowledge, the practical applications of such knowledge, and how imaging science relates to other fields of study. The pages of this journal are open to reports of new theoretical or experimental results, and to comprehensive reviews. Only original manuscripts that have not been previously published, nor currently submitted for publication elsewhere, should be submitted.

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