We have measured the temperature dependence of the resistance of Tl2Ba2CaCu2O8+x (Tl-2212) thin film at various magnetic fields parallel and normal to the c-axis. Then the U(H) relationship and irreversibility line were obtained. An important parameter n in the material equation of the Tl-2212 thin film is obtained from the U(H) relationship. The V-I characteristic curves at different applied magnetic fields and temperatures were also measured. To testify the equivalence of the two measurements, we calculated V-I curves of the same thin film by solving the flux creep equation with the obtained material equation. A comparison between the independently measured and calculated V-I curves shows a satisfactory agreement. It is, therefore, concluded that we can combine the resistive broadening R-T measurement, which is conducted at a low current density and high temperature and the V-I curve, which can be carried out at a much lower temperature, expanding the range of temperature and current density in exploring the dynamics.