Plasma deposition of a-C:H, F thin films from H2-C2F6 fed RF glow discharges

Authors: Lamendola R.; Favia P.; d'Agostino R.

Source: Plasma Sources Science and Technology, Volume 1, Number 4, 1992 , pp. 256-262(7)

Publisher: Institute of Physics Publishing

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Language: English

Document Type: Miscellaneous

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