Bulk silicon micromachining for MEMS in optical communication systems

In this: publication
By this: publisher
In this Subject: Nuclear Physics
By this author: Hoffmann M. ;&nbsp; Voges E.

Authors: Hoffmann M.; Voges E.

Source: Journal of Micromechanics and Microengineering, Volume 12, Number 4, 2002 , pp. 349-360(12)

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Abstract:

Crystalline silicon has become more and more important for optical MEMS. The increased need of bandwidth in optical communication networks has led to a number of new optical MEMS devices such as moving-fibre and moving-waveguide switches, optical cross-connects, mirrors, resonators, optical benches and fibre alignment structures which are based on wet anisotropic micromachining techniques and deep reactive ion etching of single-crystal silicon. The excellent mechanical properties as well as the optical properties and orientation-dependent etching behaviour of crystalline silicon attract attention for reliable optical components based on surface micromachining, silicon-on-insulator, integrated optics and bulk micromachining. Anisotropic etching is especially useful for the batch fabrication of large opto-mechanical devices with sub-m precision.

Language: English

Document Type: Miscellaneous

Publication date: 2002-01-01