Publisher: Elsevier

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Volume 10, Number 2, February 2002

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Microstructure and toughness of nitrogen-doped TiAl alloys
pp. 113-127(15)
Authors: Nam, C.Y.; Wee, D.M.; Wang, P.; Kumar, K.S.

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Microstructure and electrical properties of thin films of ReSi1.75 produced by co-sputtering
pp. 129-138(10)
Authors: Kuwabara, K.; Inui, H.; Yamaguchi, M.

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Site occupancy of ternary additions to B2 alloys
pp. 149-159(11)
Authors: Bozzolo, G.H.; Noebe, R.D.; Amador, C.

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Effect of process conditions on the thermoelectric properties of CoSi
pp. 177-184(8)
Authors: Kim, S.W.; Mishima, Y.; Choi, D.C.

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Single-phase interdiffusion in the B2 type intermetallic compounds NiAl, CoAl and FeAl
pp. 195-204(10)
Authors: Nakamura, R.; Takasawa, K.; Yamazaki, Y.; Iijima, Y.

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Metastable phase stability in the ternary Zr-Fe-Cr system
pp. 205-216(12)
Authors: Rodrguez, C.; Barbiric, D.A.; Pepe, M.E.; Kovacs, J.A.; Alonso, J.A.; Hojvat de Tendler, R.

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