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Volume 12, Number 2, February 2003

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Editorial Board
pp. CO2-CO2(1)

Preface
pp. v-vi(2)
Authors: Andujar, J.L.; Amaratunga, G.A.J.; Milne, W.I.; Robertson, J.; Silva, S.R.P.; Tagliaferro, A.

Improving the properties of diamond-like carbon
pp. 79-84(6)
Author: Robertson, J.

The influence of hydrogen ion bombardment on plasma-assisted hydrocarbon film growth
pp. 85-89(5)
Authors: Hopf, C.; von Keudell, A.; Jacob, W.

Plasma chemistry during the deposition of a-C:H films and its influence on film properties
pp. 90-97(8)
Authors: Benedikt, J.; Woen, R.V.; van Mensfoort, S.L.M.; Perina, V.; Hong, J.; van de Sanden, M.C.M.

Growth of hydrogenated amorphous carbon films in pulsed d.c. methane discharges
pp. 98-104(7)
Authors: Andujar, J.L.; Vives, M.; Corbella, C.; Bertran, E.

Tribological properties of a-C:H films coated by the PBII method
pp. 105-109(5)
Authors: Watanabe, T.; Ishihara, M.; Yamamoto, K.; Tsuda, O.; Tanaka, A.; Takai, O.; Koga, Y.

Fine structure at the X-ray absorption * and * bands of amorphous carbon
pp. 110-115(6)
Authors: Jimenez, I.; Gago, R.; Albella, J.M.

An EPR study at X- and W-band of defects in a-C:H films in the temperature range 5-300 K
pp. 116-123(8)
Authors: Jones, B.J.; Barklie, R.C.; Smith, G.; El Mkami, H.; Carey, J.D.; Silva, S.R.P.

Spins and microstructure of amorphous carbon
pp. 124-129(6)
Authors: von Bardeleben, H.J.; Cantin, J.L.; Zellama, K.; Zeinert, A.

Pitfalls in amorphous carbon studies
pp. 130-140(11)
Author: Lifshitz, Y.

Optical and electronic properties of amorphous carbon materials
pp. 141-150(10)
Author: Logothetidis, S.

Physics of bandtail hopping in disordered carbons
pp. 159-165(7)
Author: Godet, C.

Multilayered carbon films for tribological applications
pp. 178-184(7)
Authors: McKenzie, D.R.; Tarrant, R.N.; Bilek, M.M.M.; Ha, T.; Zou, J.; McBride, W.E.; Cockayne, D.J.H.; Fujisawa, N.; Swain, M.V.; James, N.L.; Woodard, J.C.; McCulloch, D.G.

Novel field emission structure based on tetrahedrally bonded amorphous carbon
pp. 195-200(6)
Authors: Milne, W.I.; Tsai, J.T.H.; Teo, K.B.K.

Effect of the RF power and deposition temperature on the electrical and vibrational properties of carbon nitride films
pp. 201-207(7)
Authors: Lazar, G.; Clin, M.; Charvet, S.; Therasse, M.; Godet, C.; Zellama, K.

Electronic and vibrational structures of amorphous carbon nitrides
pp. 208-218(11)
Authors: Fanchini, G.; Tagliaferro, A.; Ray, S.C.

Amorphous carbon nitride deposition by nitrogen radical sputtering C+N+O+H
pp. 219-226(8)
Authors: Nitta, S.; Aono, M.; Katsuno, T.; Naruse, Y.

Keyword Listing
pp. 230-230(1)

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