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Multi-component diffusion phenomena in multiple-wafer chemical vapour deposition reactors

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Keywords: Chemical vapour deposition; Computational fluid dynamics; Multi-component diffusion; Numerical modeling; Stefan-Maxwell equations

Document Type: Research Article

DOI: http://dx.doi.org/10.1016/0923-0467(94)02933-4

Affiliations: Delft University of Technology, Kramers Laboratorium voor Fysische Technologie, Prins Bernhardlaan 6, 2628 BW , Delft, Netherlands

Publication date: April 1, 1995

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