Ultramicroscopy

IFC (Editorial Board)
pp. CO2-CO2(1)

Contents
pp. xix-xx(2)

The S-state model: a work horse for HRTEM
pp. 179-198(20)
Authors: Geuens P.; Van Dyck D.

Ferroelectric electron holography
pp. 199-212(14)
Authors: Lichte H.; Reibold M.; Brand K.; Lehmann M.

Synchrotron soft X-ray and field-emission electron sources: a comparison
pp. 213-222(10)
Authors: Spence J.C.H.; Howells M.R.

Imaging of the boron doping in silicon using low energy SEM
pp. 223-243(21)
Authors: Mullerova I.; El-Gomati M.M.; Frank L.

Reminiscence on a long successful cooperation
pp. 245-246(2)

Numerical calculation of electron optical aberrations
pp. 247-252(6)
Author: Kasper E.

BEM simulation of Wien filters
pp. 253-261(9)
Authors: Martnez G.; Tsuno K.

Accuracy of electrostatic lens computations with FOFEM
pp. 263-270(8)
Author: Lencova B.

Simulation methods for multipole imaging systems and aberration correctors
pp. 271-291(21)
Authors: Liu H.; Munro E.; Rouse J.; Zhu X.

Theory of electron-optical achromats and apochromats
pp. 293-303(11)
Author: Rose H.

Simplified computation of third-rank image aberrations of electron-optical systems with curved axis
pp. 305-319(15)
Author: Plies E.

Low-energy foil aberration corrector
pp. 321-330(10)
Authors: van Aken R.H.; Hagen C.W.; Barth J.E.; Kruit P.

Aberration characteristics of immersion lenses for LVSEM
pp. 331-338(8)
Author: Khursheed A.

Initial resolution measurements of miniaturized electrostatic lenses for LVSEM
pp. 339-345(7)
Authors: Lutsch R.Y.; Plies E.

Electron-electron interactions in cathode objective lenses
pp. 347-354(8)
Authors: Mankos M.; Adler D.

Author index
pp. 355-356(2)

Subject index
pp. 359-360(2)