Publisher: Elsevier

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Volume 112, Number 1, February 1999

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Kinetics of radiative species in helium pulsed discharge at atmospheric pressure
pp. 1-4(4)
Authors: Ricard, A.; decomps, P.; Massines, F.

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Study of transport phenomena by 3D modeling of a microwave post-discharge nitriding reactor
pp. 5-9(5)
Authors: Belmonte, T.; Bockel, S.; Michel, H.; Ablitzer, D.

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Hanbit microwave plasma diagnostic system
pp. 10-14(5)
Authors: Kim, B.C.; Lee, K.D.; Hwang, S.M.; Lee, G.S.; Chung, K.H.

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Control of plasma profile by voltage biasing in large diameter RF produced plasma
pp. 20-24(5)
Authors: Shinohara, S.; Tsuji, H.; Yoshinaka, T.; Kawai, Y.

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Decomposition of inorganic gases in an atmospheric pressure non-equilibrium plasma
pp. 25-28(4)
Authors: Kiyokawa, K.; Matsuoka, H.; Itou, A.; Hasegawa, K.; Sugiyama, K.

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A high-voltage pulse generator for plasma immersion ion implantation applications
pp. 29-33(5)
Authors: Spassov, V.A.; Ueda, M.; Barroso, J.

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A self-consistent modeling and simulation of transformer coupled plasma discharge
pp. 34-37(4)
Authors: Yoon, N.S.; You, K.; Hwang, S.M.

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Characterization of the arc evaporation of a hot boron cathode
pp. 43-47(5)
Authors: Richter, F.; Flemming, G.; Kuhn, M.; Peter, S.; Wagner, H.

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Preparation and characterization of perfluoro-organic thin films on aluminium
pp. 48-51(4)
Authors: Lee, S.; Kwon, M.; Park J.-G.; Kim, Y.; Shin, H.

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Plasma sources and characterization in the r.f. test facility
pp. 52-55(4)
Authors: Yang, J.G.; Kim, W.S.; Chung, Y.S.; Choi, J.H.; Yoon, N.S.; You, K.; Choi, J.W.; Kim, B.C.; Kyum, M.C.; Na, H.K.; Hong, J.; Lee, G.S.; Hwang, S.M.; Huh, J.H.; Ryu, C.M.; Sim, J.H.; Son, D.C.; Hong, S.J.

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Recent advances in plasma diffusion processes
pp. 56-62(7)
Author: Rie K.-T.

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Low-pressure plasma cleaning of metallic surfaces on industrial scale
pp. 63-66(4)
Authors: Kegel, B.; Schmid, H.

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Plasma paste boronizing treatment of the stainless steel AISI 304
pp. 71-75(5)
Authors: Yoon, J.H.; Jee, Y.K.; Lee, S.Y.

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Catalytic ability of plasma heat-treated metal oxides on vapor-phase Beckmann rearrangement
pp. 76-79(4)
Authors: Sugiyama, K.; Anan, G.; Shimada, T.; Ohkoshi, T.; Ushikubo, T.

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Wear behaviour of carbon-containing tungsten coatings prepared by reactive magnetron sputtering
pp. 85-90(6)
Authors: Rebholz, C.; Schneider, J.M.; Leyland, A.; Matthews, A.

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Formation of a wear resistant non-metallic protective layer on PVD-coated cutting and forming tools
pp. 98-102(5)
Authors: Harju, E.; Kivivuori, S.; Korhonen, A.S.

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Decorative hard coatings with improved corrosion resistance
pp. 108-113(6)
Authors: Budke, E.; Krempel-Hesse, J.; Maidhof, H.; Schussler, H.

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Evaluation of the corrosion behaviour of wear-resistant PACVD coatings
pp. 114-117(4)
Authors: Pfohl, C.; Rie, K.; Hirschfeld, M.K.; Schultze, J.W.

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Erosion resistance of CVD diamond-coated titanium alloy for aerospace applications
pp. 129-132(4)
Authors: Grogler, T.; Zeiler, E.; Franz, A.; Plewa, O.; Rosiwal, S.M.; Singer, R.F.

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Bonding structure in carbon nitride films: variation with nitrogen content and annealing temperature
pp. 133-139(7)
Authors: Chowdhury, A.K.M.S.; Cameron, D.C.; Hashmi, M.S.J.

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PVD hard coated reamers in lubricant-free cutting
pp. 146-151(6)
Authors: Lugscheider, E.; Knotek, O.; Barimani, C.; Leyendecker, T.; Lemmer, O.; Wenke, R.

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Reliable PVD coatings on components: aspects of deposition and characterization for quality management
pp. 152-161(10)
Authors: Friedrich, C.; Berg, G.; Senf, J.; Broszeit, E.

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A perspective of magnetron sputtering in surface engineering
pp. 162-169(8)
Authors: Musil, J.; Vlcek, J.

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Recent advances in magnetron sputtering
pp. 170-176(7)
Authors: Arnell, R.D.; Kelly, P.J.

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The reactive magnetron deposition of CrNxOy films: first results of property investigations
pp. 181-184(4)
Authors: Collard, S.; Kupfer, H.; Hecht, G.; Hoyer, W.; Moussaoui, H.

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Titanium coating of the inner of a 1m long narrow tube by double-ended anode coaxial magnetron-pulsed plasmas
pp. 185-188(4)
Authors: Uchikawa, Y.; Sugimoto, S.; Kuwahara, K.; Fujiyama, H.; Kuwahara, H.

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Plasma carbonitriding of cemented carbide substrate as an effective pretreatment process for diamond CVD
pp. 189-193(5)
Authors: Sato, T.; Hosokawa, Y.; Ito, S.; Akashi, K.

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Spectro-ellipsometric studies of defective diamond films deposited by MPECVD
pp. 194-198(5)
Authors: Lee, S.; Han, S.; Oh, S.

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Adhesion improvement of diamond coating on silicon nitride substrate
pp. 199-203(5)
Authors: Itoh, H.; Lee, S.; Sugiyama, K.; Iwahara, H.; Tsutsumoto, T.

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Tribological behavior of silicon-incorporated diamond-like carbon films
pp. 204-209(6)
Authors: Kim, M.; Lee K.-R.; Eun, K.Y.

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PVD and ECD-competition, alternative or combination?
pp. 210-216(7)
Author: Jehn, H.A.

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Plasma-CVD of TiCN and ZrCN films on light metals
pp. 226-229(4)
Authors: Rie, K.; Wohle, J.

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Thermal characteristics of a Zr(B,C,N) coated layer manufactured by the PACVD process
pp. 230-235(6)
Authors: You, J.S.; Kang, C.; Lee, S.; Pfohl, C.; Rie, K.

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Effect of repeated Ar+ bombardment on structure and properties of PCVD thin films
pp. 236-239(4)
Authors: Xie, F.; Yuan, J.; Xu, K.; He J.-W.

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Surface cleaning by plasma-enhanced desorption of contaminants (PEDC)
pp. 240-244(5)
Authors: Kruger, P.; Knes, R.; Friedrich, J.

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Plasma cleaning of copper leadframe with Ar and Ar/H2 gases
pp. 245-249(5)
Authors: Hsieh, J.H.; Fong, L.H.; Yi, S.; Metha, G.

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Plasma deposition of tribological and optical thin film materials with a filtered cathodic arc source
pp. 257-260(4)
Authors: Martin, P.J.; Bendavid, A.; Netterfield, R.P.; Kinder, T.J.; Jahan, F.; Smith, G.

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Some properties of TiO2 layers prepared by medium frequency reactive sputtering
pp. 261-266(6)
Authors: Szczyrbowski, J.; Brauer, G.; Ruske, M.; Bartella, J.; Schroeder, J.; Zmelty, A.

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Synthesis of tin oxide films by dual ion beam sputtering using Sn target and oxygen ion beam
pp. 267-270(4)
Authors: Choe Y.-S.; Chung, J.; Kim, D.; Baik, H.K.

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Recent advances in surface processing with metal plasma and ion beams
pp. 271-277(7)
Authors: Brown, I.G.; Anders, A.; Dickinson, M.R.; MacGill, R.A.; Monteiro, O.R.

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Biomaterials modification by ion-beam processing
pp. 278-285(8)
Authors: Cui, F.Z.; Luo, Z.S.

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Characterisation of chromium nitride films prepared by ion-beam-assisted deposition
pp. 286-290(5)
Authors: Engel, P.; Schwarz, G.; Wolf, G.K.

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Electronic structures and nitride formation on ion-implanted AISI 304L austenitic stainless steel
pp. 291-294(4)
Authors: Chang, G.S.; Son, J.H.; Kim, S.H.; Chae, K.H.; Whang, C.N.; Menthe, E.; Rie, K.; Lee, Y.P.

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Surface modification on 304 SS by plasma-immersed ion implantation to improve the adherence of a CVD diamond film
pp. 295-298(4)
Authors: Nono, M.C.A.; Corat, E.J.; Ueda, M.; Stellati, C.; Barroso, J.J.; Conrad, J.R.; Shamim, M.; Fetherston, P.; Sridharan, K.

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Plasma-source ion implantation compared with glow-discharge plasma nitriding of stainless steel
pp. 307-309(3)
Authors: Gunzel, R.; Betzl, M.; Alphonsa, I.; Ganguly, B.; John, P.I.; Mukherjee, S.

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Active and passive plasma spectroscopy in a plasma immersion ion implantation (PIII) experiment
pp. 310-313(4)
Authors: Ueda, M.; Stellati, C.; Spassov, V.A.; Barroso, J.J.; Nono, M.C.A.

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A 13.56MHz multicusp ion source for gaseous ion-beam production
pp. 314-317(4)
Authors: Boonyawan, D.; Suanpoot, P.; Vilaithong, T.

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Status of vacuum and plasma technology
pp. 324-338(15)
Author: Heidsieck, H.

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Plasma surface engineering - innovative processes and coating systems for high-quality products
pp. 351-357(7)
Authors: Suchentrunk, R.; Fuesser, H.J.; Staudigl, G.; Jonke, D.; Meyer, M.

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Large area glass coating
pp. 358-365(8)
Author: Brauer, G.

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13.56MHz hollow cathode jet matrix plasma source for large area surface coating
pp. 366-372(7)
Authors: Mildner, M.; Korzec, D.; Engemann, J.

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Plasma-modified interfaces between polypropylene films and vacuum roll-to-roll coated thin barrier layers
pp. 373-378(6)
Authors: Bichler, C.; Kerbstadt, T.; Langowski, H.; Moosheimer, U.

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Ecologically important metallization processes for high-performance polymers
pp. 379-383(5)
Authors: Kupfer, H.; Hecht, G.; Ostwald, R.

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Polymer etching and deposition of amorphous silicon using a VHF coaxial helix plasma source
pp. 384-388(5)
Authors: Stephan, U.; Richter, K.; Kuske, J.; Gunzel, R.

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Effects of a quartz beam-guide on high-precision laser-assisted etching of Al2O3 ceramics
pp. 389-393(5)
Authors: Horisawa, H.; Akimoto, N.; Ashizawa, H.; Yasunaga, N.

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Surface conductivity modification of ceramics with laser radiation
pp. 394-400(7)
Authors: Stolz, B.; Poprawe, R.

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