Publisher: Elsevier

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Volume 110, Number 3, 10 December 1998

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Preparation of thin film resistors with low resistivity and low TCR by heat treatment of multilayered Cu/Ni deposits
pp. 121-127(7)
Authors: Ishikawa, M.; Enomoto, H.; Mikamoto, N.; Nakamura, T.; Matsuoka, M.; Iwakura, C.

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Surface discharge characteristics of MgO thin films prepared by RF reactive magnetron sputtering
pp. 128-135(8)
Authors: Park C.-H.; Lee, W.; Kim, D.; Ha, H.; Ju

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Rutile-type titanium oxide films synthesized by filtered arc deposition
pp. 136-139(4)
Authors: Zhang, F.; Wang, X.; Li, C.; Wang, H.; Chen, L.; Liu, X.

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Plasma electrolytic fabrication of oxide ceramic surface layers for tribotechnical purposes on aluminium alloys
pp. 140-146(7)
Authors: Yerokhin, A.L.; Voevodin, A.A.; Lyubimov, V.V.; Zabinski, J.; Donley, M.

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Enhancement of the properties of pulsed laser-deposited carbon nitride by the synchronisation of laser and N2 gas jet pulses
pp. 147-152(6)
Authors: Alexandrou, I.; Zergioti, I.; Healy, M.J.F.; Amaratunga, G.A.J.; Kiely, C.J.; Davock, H.; Papworth, A.; Fotakis, C.

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Composite TiN-Ni thin films deposited by reactive magnetron sputter ion-plating
pp. 168-172(5)
Authors: Misina, M.; Musil, J.; Kadlec, S.

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A mass-spectroscopical study of the decomposition of Ti(NMe2)4 in a mixed Ar-H2-N2 pulsed d.c. plasma
pp. 173-183(11)
Authors: Driessen, J.P.A.M.; Kuypers, A.D.; Schoonman, J.

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High-resolution electron microscopy analysis of microstructural changes in WOx electrochromic films
pp. 184-187(4)
Authors: Wang X.-G.; Yang, N.H.; Yuan, L.; Pang, S.J.

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Tribological properties and hardness of silicon nitride ceramics after ion implantation and subsequent annealing
pp. 188-193(6)
Authors: Brenscheidt, F.; Matz, W.; Wieser, E.; Moller, W.

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Morphology and characterization of the anodic coating on galvanized steels prepared by alternating currents
pp. 194-199(6)
Authors: Tan, T.R.; Cheng, J.R.; Wang, J.H.; Duh, J.G.; Shih, H.C.

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