Publisher: Elsevier

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Volume 93, Number 1, August 1997

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Reactive sputtering of dielectric layers on large scale substrates using an AC twin magnetron cathode
pp. 14-20(7)
Authors: Szczyrbowski, J.; Brauer, G.; Dicken, W.; Scherer, M.; Maasz, W.; Teschner, C.; Zmelty, A.

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Characterization of magnetron-sputtered chromium and iron nitride films
pp. 32-36(5)
Authors: Kacsich, T.; Niederdrenk, M.; Schaaf, P.; Lieb, K.P.; Geyer, U.; Schulte, O.

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Low emissivity coatings on architectural glass
pp. 37-45(9)
Authors: Schaefer, C.; Brauer, G.; Szczyrbowski, J.

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High rate deposition by vacuum arc methods
pp. 64-68(5)
Authors: Schultrich, B.; Siemroth, P.; Scheibe, H.

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Large scale fabrication of hard superlattice thin films by combined steered arc evaporation and unbalanced magnetron sputtering
pp. 69-87(19)
Authors: Donohue, L.A.; MUnz, W.; Lewis, D.B.; Cawley, J.; Hurkmans, T.; Trinh, T.; Petrov, I.; Greene, J.E.

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PVD-Coatings for wear protection in dry cutting operations
pp. 88-92(5)
Authors: Tonshoff, H.K.; Mohlfeld, A.

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Plasma conditions for the deposition of wear-resistant carbon-coatings
pp. 93-98(6)
Authors: Reuter, W.; Voigt, J.; Neuffer, A.; Lunk, A.

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New generation sputtering and plasma polymerization plant for reflector production
pp. 99-104(6)
Authors: Grunwald, H.; Jung, M.; Kukla, R.; Adam, R.; Kunkel, S.

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Problems of large scale deposition of thin plasma polymer films
pp. 105-111(7)
Authors: Poll H.-U.; Schreiter, S.

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Duo-Plasmaline - A linearly extended homogeneous low pressure plasma source
pp. 112-118(7)
Authors: Petasch, W.; Rauchle, E.; Muegge, H.; Muegge, K.

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Development and evaluation of PACVD coated cermet tools
pp. 119-127(9)
Authors: Tonshoff, H.K.; Blawit, C.

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Multi-jet hollow cathode discharge for remote polymer deposition
pp. 128-133(6)
Authors: Korzec, D.; Engemann, J.; Mildner, M.; Ningel, K.; Borgmeier, O.; Theirich, D.

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Large area plasma cleaning with 26'' microwave slot antenna plasma source SLAN II
pp. 134-141(8)
Authors: Winter, R.; Korzec, D.; Engemann, J.

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Wear improvement of silicate glass surfaces by ion implantation
pp. 150-156(7)
Authors: Richter, E.; deshkovskaya, A.A.

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