Electrical characterization of low temperature deposited TiO2 films on strained-SiGe layers

Authors: Dalapati G.K.; Chatterjee S.; Samanta S.K.; Maiti C.K.1

Source: Applied Surface Science, Volume 210, Number 3, 15 April 2003 , pp. 249-254(6)

Publisher: Elsevier

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Keywords: Electrical characterization; Low temperature deposition; TiO2 films; High-K

Language: English

Document Type: Research article

DOI: 10.1016/S0169-4332(03)00149-1

Affiliations: 1: Department of Electronics & ECE, IIT Kharagpur, 721302, Kharagpur, India

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