Electrical characterization of low temperature deposited TiO₂ films on strained-SiGe layers

Authors: Dalapati G.K.; Chatterjee S.; Samanta S.K.; Maiti C.K.

Source: Applied Surface Science, Volume 210, Number 3, 15 April 2003 , pp. 249-254(6)

Publisher: Elsevier

Keywords: Electrical characterization; Low temperature deposition; TiO₂ films; High-K

Language: English

Document Type: Research article

DOI: http://dx.doi.org/10.1016/S0169-4332(03)00149-1

Affiliations: 1: Department of Electronics & ECE, IIT Kharagpur, 721302, Kharagpur, India

Publication date: 2003-04-15

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• In this Subject: General & Civil Engineering
• By this author: Dalapati G.K. ;  Chatterjee S. ;  Samanta S.K. ;  Maiti C.K.

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