Structural stability of ultrathin silicon oxynitride film improved by incorporated nitrogen

Authors: Suzuki M.; Saito Y.1

Source: Applied Surface Science, Volume 173, Number 3, 29 March 2001 , pp. 171-176(6)

Publisher: Elsevier

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Keywords: Oxynitride film; Anneal; Stability

Language: English

Document Type: Research article

DOI: 10.1016/S0169-4332(00)00548-1

Affiliations: 1: Department of Electrical Engineering and Electronics, Seikei University, Kichijoji-Kitamachi 3, Musashino-shi, 180-8633, Tokyo, Japan

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