Plasma-enhanced chemical vapor deposition of PbTiO₃ thin films

Authors: Tong M.; Dai G.¹; Gao D.

Source: Materials Letters, Volume 46, Number 2, November 2000 , pp. 60-64(5)

Publisher: Elsevier

Keywords: PbTiO₃; Perovskites; PECVD technique; Thin films

Language: English

Document Type: Short communication

DOI: 10.1016/S0167-577X(00)00143-9

Affiliations: 1: Department of Electronic Engineering, Jilin University, 130023, Changchun, People's Republic of China

Links for this article

http://www.ingentaconnect.com/els/0167577x/2000/00000046/00000002/art00143
http://openurl.ingenta.com/content?genre=article&issn=0167-577X&volume=46&issue=2&spage=60&epage=64
http://dx.doi.org/10.1016/S0167-577X(00)00143-9

Plasma-enhanced chemical vapor deposition of PbTiO3 thin films