Plasma-enhanced chemical vapor deposition of PbTiO₃ thin films

Authors: Tong M.; Dai G.; Gao D.

Source: Materials Letters, Volume 46, Number 2, November 2000 , pp. 60-64(5)

Publisher: Elsevier

Keywords: PbTiO₃; Perovskites; PECVD technique; Thin films

Language: English

Document Type: Short communication

DOI: http://dx.doi.org/10.1016/S0167-577X(00)00143-9

Affiliations: 1: Department of Electronic Engineering, Jilin University, 130023, Changchun, People's Republic of China

Publication date: 2000-11-01

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• By this: publisher
• In this Subject: General & Civil Engineering
• By this author: Tong M. ;  Dai G. ;  Gao D.

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