Publisher: Elsevier

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Volume 72, Number 4, 16 January 2004

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Author Index
pp. VII-VIII(2)

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Volume Contents
pp. III

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Substrate temperature control from RHEED intensity measurements
pp. 363-367(5)
Authors: Mazurek, P.; Daniluk, A.; Paprocki, K.

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Formation and properties of AgInSe2 thin films by co-evaporation
pp. 369-378(10)
Authors: Santhosh Kumar, M.C.; Pradeep, B.

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Vacuum performance of a beam screen with charcoal for the LHC long straight sections
pp. 379-383(5)
Authors: Anashin, V.V.; Dostovalov, R.V.; Krasnov, A.A.; Collins, I.R.; Malyshev, O.B.

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Refraction properties of PECVD of silicon nitride film
pp. 385-392(8)
Authors: Kim, B.; Kim, D.W.; Han, S.S.

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Kinetic Monte Carlo simulation of Cu thin film growth
pp. 405-410(6)
Authors: Zhang, P.; Zheng, X.; Wu, S.; Liu, J.; He, D.

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Interfacial electron density profile in Nb/Si bilayer films: an X-ray reflectivity study
pp. 419-426(8)
Authors: Suresh, N.; Thakur, R.; Phase, D.M.; Chaudhari, S.M.

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Some features of molecular flow in a rotor-stator row with real topology
pp. 427-438(12)
Authors: Amoli, A.; Ebrahimi, R.; Hosseinalipour, S.M.

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Characteristics of DLC films by DC magnetron sputtering incorporated with cesium
pp. 445-451(7)
Authors: Choi, D.J.; Koo, W.H.; Jeong, S.M.; Han, D.W.; Lee, D.Y.; Baik, H.K.; Jang, S.W.; Lee, S.M.

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Structural, optical and electrical properties of thermally evaporated Ag2S thin films
pp. 453-460(8)
Authors: El-Nahass, M.M.; Farag, A.A.M.; Ibrahim, E.M.; Abd-El-Rahman, S.

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Tribological mechanism and property of 9Cr18 friction pair at atmosphere and in vacuum
pp. 461-466(6)
Authors: Yu, X.; Wang, C.; Jiang, G.; Liu, H.; Hua, M.

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Microstructure and electrochemical properties of Zircaloy-4 under Fe ion irradiation
pp. 467-473(7)
Authors: Chen, X.W.; Bai, X.D.; Deng, P.Y.; Zhou, Q.G.; Yu, R.H.; Chen, B.S.

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Preparation and electrical characterization of Cd0.8Zn0.2Te/Si thin films
pp. 475-479(5)
Authors: Prabakar, K.; Venkatachalam, S.; Jeyachandran, Y.L.; Narayandass, S.K.; Mangalaraj, D.

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Amorphous hydrogenated carbon films used as masks for silicon microtips fabrication in a reactive ion etching with SF6 plasma
pp. 485-488(4)
Authors: Alves, M.A.R.; Porto, L.F.; de Faria, P.H.L.; Braga, E.S.

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Ni-based superalloy surface alloying by double-glow plasma surface alloying technique
pp. 489-500(12)
Authors: Jiang, X.; Zhang, X.; Xie, X.; Xu, Z.; Liu, W.

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