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Modelling of plasma etching using a generalized regression neural network

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Keywords: Modelling; Neural network; Plasma etching

Document Type: Research Article

DOI: http://dx.doi.org/10.1016/S0042-207X(03)00075-7

Affiliations: Department of Electronic Engineering, Sejong University, 98 Kunja-Dong, Kwangjin-Ki, 143-747, Seoul, South Korea

Publication date: July 25, 2003

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