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Publisher: Elsevier

Volume 71, Number 4, 25 July 2003

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Author Index
pp. IX-X(2)

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New Editor for North America
pp. 437-438(2)
Author: Colligon, J.S.

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A study of fundamental mechanisms of Si-B-N composite films deposited by duplex treatment
pp. 451-457(7)
Authors: Wang, C.; Yu, X.; Yu, J.; Meng, H.

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Preparation and microstructure of nanocrystalline Rb0.5Cs0.5Ag4I5 thin films on NaCl substrates
pp. 459-463(5)
Authors: Sun, J.L.; Guang-Yan, T.; Sheng, L.; Yang, C.; Ji-Hua, G.

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Study on variable capacitance diode of (p)nc-Si:H/(n)c-Si heterojunction
pp. 465-469(5)
Authors: Wensheng, W.; Tianmin, W.; Chunxi, Z.; Guohua, L.; Yuexia, L.

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Patterning of Ru electrode in O2/Cl2 gas using reactive ion etcher
pp. 481-486(6)
Authors: Kim, H.W.; Ju, B.; Kang, C.

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Investigation on the structure of TiO2 films sputtered on alloy substrates
pp. 487-490(4)
Authors: Gu, G.; Li, Y.A.; Tao, Y.C.; He, Z.; Li, J.J.; Yin, H.; Li, W.Q.; Zhao Y.-N.

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Reactive ion etching of Pt electrode using O2-based plasma
pp. 491-496(6)
Authors: Kim, H.W.; Kang, C.

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Modelling of plasma etching using a generalized regression neural network
pp. 497-503(7)
Authors: Kim, B.; Kim, S.; Kim, K.

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Neural network modelling of cold-cathode gauge parameters
pp. 505-515(11)
Authors: Belic, L.I.; Belic, I.; Erjavec, B.; Setina, J.

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Electrochemical behavior of p-Si/TiC in aqueous HF
pp. 517-522(6)
Authors: Ouendadji, S.; Ait-Hamouda, K.; Gabouze, N.; Saoula, N.; Henda, K.

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Effect of annealing on the characteristics of Au/Cr bilayer films grown on glass
pp. 523-528(6)
Authors: Huang, Y.; Qiu, H.; Wang, F.; Pan, L.; Tian, Y.; Wu, P.

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