Publisher: Elsevier

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Volume 71, Number 3, 19 May 2003

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SYPO Special Issue
pp. 347-347(1)
Authors: Kersten, H.; Winter, J.

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Intermediate gas phase precursors during plasma CVD of HMDSO
pp. 349-359(11)
Authors: Theirich, D.; Soll, C.; Leu, F.; Engemann, J.

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Dust particle formation in low pressure Ar/CH4 and Ar/C2H2 discharges used for thin film deposition
pp. 377-390(14)
Authors: Berndt, J.; Hong, S.; Kovacevic, E.; Stefanovic, I.; Winter, J.

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Mo/Si multilayers for EUV lithography by ion beam sputter deposition
pp. 407-415(9)
Authors: Chasse, T.; Neumann, H.; Ocker, B.; Scherer, M.; Frank, W.; Frost, F.; Hirsch, D.; Schindler, A.; Wagner, G.; Lorenz, M.; Otto, G.; Zeuner, M.; Rauschenbach, B.

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The barrier discharge: basic properties and applications to surface treatment
pp. 417-436(20)
Authors: Wagner H.-E.; Brandenburg, R.; Kozlov, K.V.; Sonnenfeld, A.; Michel, P.; Behnke, J.F.

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