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Volume 69, Number 4, 24 January 2003
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Author Index
pp. VIII-X

Properties of implanted PET by W ion using MEVVA implantation
pp. 461-466(6)
Authors: Yuguang W.; Tonghe Z.; Andong L.; Xu Z.; Gu Z.

Quantitative depth profiling of Al3Hf phase formed by Hf ions implantation into aluminum
pp. 467-472(6)
Authors: Miao W.; Tao K.; Liu X.; Li B.; Liu B.

Influence of annealing on ZnO thin film grown by plasma-assisted MOCVD
pp. 473-476(4)
Authors: Du G.; Wang J.; Wang X.; Jiang X.; Yang S.; Ma Y.; Yan W.; Gao D.; Liu X.; Cao H.; Xu J.; Chang R.P.H.

Dynamical model of total and partial pressures in a vacuum system due to intermittent desorption
pp. 477-487(11)
Authors: Nevshupa R.A.; de Segovia J.L.; Peressadko A.G.; Deulin E.A.

MOCVD growth of strain-compensated multi-quantum wells light emitting diode
pp. 489-493(5)
Authors: Yu Y.; Qin X.; Huang B.; Wei J.; Zhou H.; Pan J.; Chen W.; Qi Y.; Zhang X.; Ren Z.

Synthesis and optical characterization of amorphous carbon nitride thin films by hot filament assisted RF plasma CVD
pp. 495-500(6)
Authors: Kundoo S.; Chattopadhyay K.K.; Banerjee A.N.; Nandy S.K.

Electron beam surface treatment. Part I: surface hardening of AISI D3 tool steel
pp. 513-516(4)
Authors: Song R.G.; Zhang K.; Chen G.N.

CEMS investigations of AISI M2 steel after ion implantation by nitrogen, boron and carbon
pp. 521-527(7)
Authors: Kholmetskii A.L.; Anischik V.M.; Uglov V.V.; Rusalsky D.P.; Kuleshov A.K.; Fedotova J.A.

Comparative study of electron beam-gas interaction in an SEM operating at pressures up to 300Pa
pp. 537-543(7)
Authors: Kadoun A.; Belkorissat R.; Khelifa B.; Mathieu C.

Characteristics of n-Cd0.9 Zn0.1S/p-CdTe heterojunctions
pp. 545-555(11)
Authors: Redwan M.A.; Aly E.H.; Soliman L.I.; El-Shazely A.A.; Zayed H.A.

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