Publisher: Elsevier

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Volume 67, Number 3, 26 September 2002

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Editorial Board
pp. CO2-CO2(1)

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Author Index
pp. IX-XI(3)

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Foreword
pp. 299-299(1)
Authors: de Segovia, J.L.; Matnez-Duart, J.M.; Tabares, F.L.

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DSMC analysis of thermal transpiration of capacitance diaphragm gauge
pp. 301-306(6)
Authors: Nishizawa, S.; Hirata, M.

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Extending the range of pressure generated dynamically up to 100Pa in a calibration chamber pumped by a turbomolecular pump
pp. 307-310(4)
Authors: Stanek, F.; Tesar, J.; Peksa, L.; Gronych, T.; Repa, P.

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Becker's vacuum gauge operated in the decremental mode
pp. 317-320(4)
Authors: Gronych, T.; Repa, P.; Peksa, L.

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Preliminary Monte Carlo calculation of the conductance of the aperture of a pressure calibration system in the UHV range
pp. 321-326(6)
Authors: Gomez-Goni, J.; Lobo, P.J.; Sanchez, J.A.; Cereceda, N.; Matilla, M.C.

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Moly flow..er-the computer program for calculation of vacuum system conductance
pp. 327-332(6)
Authors: Niewinski, M.; Szwemin, P.

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Measurement of the pressure differences in a large chamber where the pressure is generated dynamically
pp. 333-338(6)
Authors: Peksa, L.; Gronych, T.; Repa, P.; Tesar, J.

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Large accelerator vacuum system engineering
pp. 347-357(11)
Author: Dabin, Y.

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The vacuum system of the LHCb vertex detector
pp. 363-371(9)
Authors: van den Brand, J.F.J.; Doets, M.; Kraan, M.; Klous, S.; Kaan, A.P.

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Vacuum system of the neutral beam injectors at the stellarator TJ-II
pp. 379-384(6)
Authors: Liniers, M.; Garca, A.; Fuentes, C.; Guasp, J.; Carrasco, R.; Alonso, J.; Medrano, M.

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Acid-base characterisation of flat oxide-covered metal surfaces
pp. 385-392(8)
Author: Barthes-Labrousse, M.

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First boronization of the TJ-II stellarator
pp. 393-397(5)
Authors: Tafalla, D.; Tabares, F.L.

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Erosion and redeposition of wall material in controlled fusion devices
pp. 399-408(10)
Authors: Philipps, V.; Wienhold, P.; Kirschner, A.; Rubel, M.

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Deuterium segregation on vanadium deuteride surfaces
pp. 409-413(5)
Authors: Nowicka, E.; Dus, R.

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The discharge tube material influence on N2-O2 DC glow discharge
pp. 415-420(6)
Authors: Kanka, A.; Kylian, O.; Hrachova, V.

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Molecular desorption by synchrotron radiation and sticking coefficient at cryogenic temperatures for H2, CH4, CO and CO2
pp. 421-428(8)
Authors: Baglin, V.; Collins, I.R.; Grobner, O.; Grunhagel, C.; Jenninger, B.

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Valence band ultraviolet photoemission spectroscopy of Dy/W(100)
pp. 429-433(5)
Authors: Moslemzadeh, N.; Barrett, S.D.; Dhanak, V.R.; Miller, G.

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UV-visible reflectivity study of the synthesis and growth of nanocrystals obtained by ion implantation
pp. 451-455(5)
Authors: Desnica, U.V.; Desnica-Frankovic, I.D.; Gamulin, O.; White, C.W.; Sonder, E.; Zuhr, R.A.

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Nanoindentation study of Ti6Al4V alloy nitrided by low intensity plasma jet process
pp. 457-461(5)
Authors: Barbieri, F.C.; Otani, C.; Lepienski, C.M.; Urruchi, W.I.; Maciel, H.S.; Petraconi, G.

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Preparation and characterization of TiN-Ag nanocomposite films
pp. 463-470(8)
Authors: de los Arcos, T.; Oelhafen, P.; Aebi, U.; Hefti, A.; Duggelin, M.; Mathys, D.; Guggenheim, R.

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Electron spectroscopic studies of nanocomposite PVD TiAlBN coatings
pp. 471-476(6)
Authors: Baker, M.A.; Rebholz, C.; Leyland, A.; Matthews, A.

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Deposition of composite and nanolaminate ceramic coatings by sputtering
pp. 477-483(7)
Authors: Teixeira, V.; Monteiro, A.; Duarte, J.; Portinha, A.

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Structure and chemistry of SiOx (x<2) systems
pp. 491-499(9)
Authors: Barranco, A.; Yubero, F.; Espinos, J.P.; Holgado, J.P.; Caballero, A.; Gonzalez-Elipe, A.R.; Mejias, J.A.

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Angular dependence of the steady-state oxygen surface content in oxygen sputtered silicon at several impact energies
pp. 501-505(5)
Authors: Serrano, J.J.; Guzman, B.; Blanco, J.M.; Ameziane, O.; Aguilar, M.

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Composition and optical properties of silicon oxynitride films deposited by electron cyclotron resonance
pp. 507-512(6)
Authors: del Prado, A.; San Andres, E.; Martnez, F.L.; Martil, I.; Gonzalez-Daz, G.; Bohne, W.; Rohrich, J.; Selle, B.; Fernandez, M.

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Compositional characterization of silicon nitride thin films prepared by RF-sputtering
pp. 513-518(6)
Authors: Vila, M.; Martn-Gago, J.A.; Munoz-Martn, A.; Prieto, C.; Miranzo, P.; Osendi, M.I.; Garca-Lopez, J.; Respaldiza, M.A.

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Characterization of amorphous silicon carbon alloys by IBA technique and optical spectroscopy
pp. 519-523(5)
Authors: Gracin, D.; Jaksic, M.; Bogdanovic-Radovic, I.; Medunic, Z.; Car, T.; Pracek, B.

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Physical properties of plasma deposited SiOx thin films
pp. 525-529(5)
Authors: San Andres, E.; del Prado, A.; Martil, I.; Gonzalez, G.; Martnez, F.L.; Bravo, D.; Lopez, F.J.; Fernandez, M.

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Rapid thermal annealing effects on plasma deposited SiOx:H films
pp. 531-536(6)
Authors: San Andres, E.; del Prado, A.; Martil, I.; Gonzalez Daz, G.; Martinez, F.L.; Bravo, D.; Lopez, F.J.

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Tribological study of vanadium-based alloys ion implanted at low energy and high temperature
pp. 543-550(8)
Authors: Garca, J.A.; Rodrguez, R.; Sanchez, R.; Martnez, R.; Varela, M.; Caceres, D.; Munoz, A.; Vergara, I.; Ballesteros, C.

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Tribological and mechanical properties of CNx- and SiCNx-TiN/Ti multilayered systems grown onto steel
pp. 551-558(8)
Authors: Fernandez-Ramos, C.; Sanchez-Lopez, J.C.; Belin, M.; Donnet, C.; Pascaretti, F.; Fernandez, A.

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Tribological behaviour of hard coatings deposited by arc-evaporation PVD
pp. 559-566(8)
Authors: Rodrguez, R.J.; Garca, J.A.; Medrano, A.; Rico, M.; Sanchez, R.; Martnez, R.; Labrugere, C.; Lahaye, M.; Guette, A.

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Influence of nitrogen concentration on conductivity of N-doped a-SiC:H films deposited by PECVD
pp. 567-570(4)
Authors: Huran, J.; Hotovy, I.; Kobzev, A.P.; Balalykin, N.I.

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New routes to SnO2 heteroepitaxy
pp. 571-575(5)
Authors: Tarre, A.; Rosental, A.; Aidla, A.; Aarik, J.; Sundqvist, J.; Harsta, A.

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Characterization of MgO thin films grown by rf-sputtering
pp. 577-581(5)
Authors: Caceres, D.; Colera, I.; Vergara, I.; Gonzalez, R.; Roman, E.

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Microstructural characterization of iron thin films prepared by sputtering at very low temperatures
pp. 583-588(6)
Authors: Munoz-Martn, A.; Vila, M.; Prieto, C.; Ocal, C.; Martnez, J.L.

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Microstructure study of indium tin oxide thin films by optical methods
pp. 589-594(6)
Authors: Cui, H.; Teixeira, V.; Monteiro, A.

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A W-spacer GOLD TFT with high performance and high reliability
pp. 595-598(4)
Authors: Zan, H.W.; Peng, D.Z.; Shih, P.S.; Chang, T.C.; Liu, P.T.; Chang, C.Y.

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Protection of industrial sensors with ta-C
pp. 599-604(6)
Authors: Tiainen V.-M.; Lappalainen, R.; Anttila, A.

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VLSI spin-offs and technological innovation
pp. 605-609(5)
Author: Tate, T.J.

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Transparent films on polymers for photovoltaic applications
pp. 611-616(6)
Authors: Herrero, J.; Guillen, C.

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Modification of metal-oxide-semiconductor devices by electron injection in high fields
pp. 617-621(5)
Authors: Bondarenko, G.G.; Andreev, V.V.; Stolyarov, A.A.; Tkachenko, A.L.

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Deposition of PVD solar absorber coatings for high-efficiency thermal collectors
pp. 623-627(5)
Authors: Nunes, C.; Teixeira, V.; Collares-Pereira, M.; Monteiro, A.; Roman, E.; Martin-Gago, J.

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Discharge characteristics of a magnetron cell in ultrahigh vacuum
pp. 629-633(5)
Authors: Vesel, A.; Mozetic, M.

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Simulation of ion beam induced atomic mixing of interfaces
pp. 635-639(5)
Authors: Jimenez-Saez, J.C.; Domnguez-Vazquez, J.; Perez-Martn, A.M.C.; Jimenez-Rodrguez, J.J.

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Comparison of poly-Si films deposited by UHVCVD and LPCVD and its application for thin film transistors
pp. 641-645(5)
Authors: Peng, D.Z.; Zan, H.W.; Shih, P.S.; Chang, T.C.; Lin, C.W.; Chang, C.Y.

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Ageing of pulsed-laser-deposited bioactive glass films
pp. 647-651(5)
Authors: Gonzalez, P.; Serra, J.; Liste, S.; Chiussi, S.; Leon, B.; Perez-Amor, M.

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Pulse repetition rate dependence of hydroxylapatite deposition by laser ablation
pp. 653-657(5)
Authors: Arias, J.L.; Mayor, M.B.; Pou, J.; Leon, B.; Perez-Amor, M.

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Investigations of SnO2 thin films prepared by plasma oxidation
pp. 665-671(7)
Authors: Stryhal, Z.; Pavlk, J.; Novak, S.; Mackova, A.; Perina, V.; Veltruska, K.

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GaPO4 high temperature crystal microbalance with zero temperature coefficient
pp. 687-691(5)
Authors: Thanner, H.; Krempl, P.W.; Wallnofer, W.; Worsch, P.M.

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Fabrication of 2D, 1D and 0D ordered metallic nanostructures
pp. 693-698(6)
Authors: Gonzalez, E.M.; Villegas, J.E.; Jaque, D.; Navarro, E.; Vicent, J.L.

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