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Characterizing the effects of multiprocess parameters on the preferred orientation of TiN coating using a combined index

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Keywords: Hollow cathode discharge; Preferred orientation; Titanium nitride

Document Type: Research Article

DOI: http://dx.doi.org/10.1016/S0042-207X(01)00416-X

Affiliations: ITRI, Materials Research Laboratories, Bldg. 77, 195-5 Chung Hsing Rd., Section 4, Chutung, Hsinchu 310, , ROC, , Taiwan

Publication date: June 1, 2002

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