Some current issues in the use and application of ionised plasma for silicon semiconductor processing research
Authors: Hurley, R.E.; Gamble, H.S.
Source: Vacuum, Volume 63, Number 4, 16 August 2001 , pp. 627-639(13)
Document Type: Review Article
Affiliations: Northern Ireland Semiconductor Research Centre, School of Electrical and Electronic Engineering, The Queen's University of Belfast, Ashby Building, Stranmillis Road, BT9 5AH, Belfast, UK
Publication date: August 16, 2001