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Simulation of two-beam ion implantation in the multilayer and multicomponent targets

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Keywords: High dose ion implantation; Monte-Carlo simulation; Sputtering

Document Type: Research Article

DOI: http://dx.doi.org/10.1016/S0042-207X(01)00228-7

Affiliations: aInstitute of Applied Physics Problems, ul. Kurchatova 7, 220064, , Minsk, Belarus

Publication date: August 16, 2001

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