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Publisher: Elsevier

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Volume 63, Number 3, 2 August 2001

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The energy balance at substrate surfaces during plasma processing
pp. 385-431(47)
Authors: Kersten, H.; deutsch, H.; Steffen, H.; Kroesen, G.M.W.; Hippler, R.

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Versatile microwave PECVD technique for deposition of DLC and other ordered carbon nanostructures
pp. 433-439(7)
Authors: Kumar, S.; Rauthan, C.M.S.; Dixit, P.N.; Srivatsa, K.M.K.; Khan, M.Y.; Bhattacharyya, R.

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Influence of the methane concentration on HF-CVD diamond under atmospheric pressure
pp. 449-454(6)
Authors: Hirakuri, K.K.; Kobayashi, T.; Nakamura, E.; Mutsukura, N.; Friedbacher, G.; Machi, Y.

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