Publisher: Elsevier

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Volume 61, Number 2, 14 May 2001

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Editorial
pp. ix-ix(1)
Authors: Pervan, P.; Stori, H.; Jenko, M.; Lohner, T.

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Volume 61 Author Index
pp. vii-viii(2)

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Interaction of CO molecules adsorbed on metal surfaces
pp. 89-93(5)
Authors: Brako, R.; Sokcevic, D.

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Inverse lifetime of the surface and image states on Au(111)
pp. 95-100(6)
Authors: Chulkov, E.V.; Machado, M.; Silkin, V.M.

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Polarization vectors in a 2D Wigner crystal
pp. 101-105(5)
Author: Lenac, Z.

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Recoil broadening of the elastic peak in electron spectroscopy
pp. 107-111(5)
Authors: Gergely, G.; Menyhard, M.; Benedek, Z.; Sulyok, A.; Kover, L.; Toth, J.; Varga, D.; Berenyi, Z.; Tokesi, K.

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Uptake of C6 cyclic hydrocarbons on Pt
pp. 119-122(4)
Authors: Hlavathy, Z.; Tetenyi, P.

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Ellipsometry and spectroscopy of porous glass surfaces
pp. 123-128(6)
Authors: Ovechko, V.S.; Dmytruk, A.M.; Fursenko, O.V.; Lepeshkina, T.P.

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CO adsorption on Pd clusters deposited on pyrolytically prepared SnO2 studied by XPS
pp. 129-134(6)
Authors: Veltruska, K.; Tsud, N.; Brinzari, V.; Korotchenkov, G.; Matoln, V.

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XPS and ESD study of carbon and oxygen chemistry on TiZrV NEG
pp. 135-139(5)
Authors: Sutara, F.; Tsud, N.; Veltruska, K.; Matoln, V.

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On the determination of ternary segregation parameters
pp. 141-144(4)
Authors: Viljoen, E.C.; Jordaan, W.A.; du Plessis, J.

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Strained growth in surfactant-mediated heteroepitaxy
pp. 145-149(5)
Authors: Liu B.-G.; Scholl, E.

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Texture measurements on electrical steels alloyed with tin
pp. 151-155(5)
Authors: Godec, M.; Jenko, M.; Mast, R.; Jurgen Grabke, H.

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Surface nitridation processes and non-linear behaviour of the reactive magnetron discharge with titanium target
pp. 163-167(5)
Authors: Luca, D.; denier van der Gon, A.W.; Anita, V.; Ponjee, M.W.G.; Brongersma, H.H.; Popa, G.

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Investigation of tungsten cathodes activated with Ba2CaWO6
pp. 169-173(5)
Authors: Riedel, M.; Dusterhoft, H.; Nagel, F.

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Condensation and structure of multiphase thin films
pp. 183-191(9)
Author: Eisenmenger-Sittner, C.

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Epitaxial growth of quaterthiophene thin films by organic molecular beam deposition
pp. 193-197(5)
Authors: Borghesi, A.; Besana, D.; Sassella, A.

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RF hydrogen-plasma-related defects in thin SiO2/p-Si structures
pp. 199-203(5)
Authors: Simeonov, S.; Yourukov, I.; Kafedjiiska, E.; Szekeres, A.

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Optical and electrical properties of LPCVD silicon oxynitride films on silicon
pp. 205-209(5)
Authors: Szekeres, A.; Alexandrova, S.; Modreanu, M.; Cosmin, P.; Gartner, M.

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Gaseous precursors of diamond-like carbon films: chemical composition of CH4/Ar plasmas
pp. 211-215(5)
Authors: Riccardi, C.; Barni, R.; Sindoni, E.; Fontanesi, M.; Tosi, P.

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RHEED study of Nb thin film growth on Cu(111) and (100) single-crystals
pp. 217-221(5)
Authors: Masek, K.; Matoln, V.

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Neural network approach in image analysis of complex systems
pp. 223-227(5)
Authors: Maly, M.; Hrach, R.; Novotny, D.

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Sputtered yttrium oxide thin films appropriate for electrochemical sensors
pp. 229-234(6)
Authors: Ivanic, R.; Rehacek, V.; Novotny, I.; Breternitz, V.; Spiess, L.; Knedlik, C.; Tvarozek, V.

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PVD CrN coating for protection of extrusion dies
pp. 241-244(4)
Authors: Panjan, P.; Cvahte, P.; Cekada, M.; Navinsek, B.; Urankar, I.

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Refractive index of sputtered silicon oxynitride layers for antireflection coating
pp. 245-249(5)
Authors: Serenyi, M.; Racz, M.; Lohner, T.

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Grain boundary defects in RTCVD polycrystalline silicon for solar cells
pp. 257-262(6)
Authors: Grozdanic, D.; Milat, O.; Rakvin, B.; Pivac, B.; Slaoui, A.; Monna, R.

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Study of thin SiO2 and its interface formed by thermal oxidation of rf hydrogen plasma-cleaned silicon
pp. 263-268(6)
Authors: Szekeres, A.; Paneva, A.; Alexandrova, S.

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XPS and ellipsometric study of DLC/silicon interface
pp. 269-273(5)
Authors: Zajckova, L.; Veltruska, K.; Tsud, N.; Franta, D.

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High-temperature semiconductor gas sensors
pp. 275-278(4)
Authors: Bene, R.; Pinter, Z.; Perczel, I.V.; Fleischer, M.; Reti, F.

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Optical characterization of diamond-like carbon films
pp. 279-283(5)
Authors: Franta, D.; Zajckova, L.; Ohldal, I.; Janca, J.

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Ion beam mixing of Ni/Al multilayer structure at different temperatures
pp. 291-296(6)
Authors: Zalar, A.; Jagielski, J.; Mozetic, M.; Pracek, B.; Panjan, P.

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Non-linearity of diffusion in amorphous Si-Ge multilayers
pp. 297-301(5)
Authors: Csik, A.; Beke, D.L.; Langer, G.A.; Erdelyi, Z.; Daroczi, L.; Kapta, K.; Kis-Varga, M.

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Quantitative analysis of a-Si1-xCx:H thin films by vibrational spectroscopy and nuclear methods
pp. 303-308(6)
Authors: Gracin, D.; Bogdanovic, I.; Borjanovic, V.; Jaksic, M.; Pastuovic, Z.; Dutta, J.M.; Vlahovic, B.; Nemanich, R.J.

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Microhardness characterization of Al-W thin films
pp. 309-316(8)
Authors: Stubicar, M.; Tonejc, A.; Radic, N.

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Self-organization of oxide nanodots generated by low energy Ar+ bombardment on TiO2(110)-(1x2)
pp. 317-322(6)
Authors: Berko, A.; Bro, T.; Kecskes, T.; Solymosi, F.

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Technology and performance of 150nm gate length InGaP/InGaAs/GaAs pHEMTs
pp. 323-327(5)
Authors: Lalinsky, T.; Skriniarova, J.; Kuzmk, J.; Hasenohrl, S.; Fox, A.; Tomaska, M.; Mozolova, Z.; Kovacik, T.; Krajcer, A.; Kordos, P.

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T-shaped gates for heterostructure field effect transistors
pp. 329-332(4)
Authors: Lalinsky, T.; Skriniarova, J.; Kostic, I.; Hart van der, A.; Hrkut, P.; Hasck, S.; Matay, L.; Mozolova, Z.; Kordos, P.

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InGaAs/InGaP HEMTs: technological optimization and analytical modelling
pp. 333-337(5)
Authors: Kuzmk, J.; Hasenohrl, S.; Kudela, R.; Hasck, S.; Mozolova, Z.; Lalinsky, T.; Vogrincic, P.; Breza, J.; Skriniarova, J.; Fox, A.; Kordos, P.

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Computer simulation of evolution of nanometric microparticles in the field of the solid-vacuum interface
pp. 339-344(6)
Authors: Samsonov, V.M.; Muravyev, S.D.; Dronnikov, V.V.

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Figure of merit of quasicrystals: the case of Al-Cu-Fe
pp. 345-348(4)
Authors: Bilusic, A.; Pavuna, D.; Smontara, A.

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Common origin of doping-limiting mechanisms in IIB-VI compounds and alloys
pp. 361-365(5)
Authors: desnica, U.V.; Dunja desnica-Frankovic, I.

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Discharge cleaning with hydrogen plasma
pp. 367-371(5)
Author: Mozetic, M.

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The visibility of UV and visible lines of highly ionized carbon in spectra of laser-produced plasmas
pp. 385-389(5)
Authors: Andreic, Z.; Gracin, D.; Aschke, L.; Kunze, H.

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Diagnostic research of highly ionized plasma generated by an ECR ion source
pp. 391-396(6)
Authors: Szabo, C.; Biri, S.; Kenez, L.; Suta, T.; Valek, A.

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Bohm criterion in magnetron plasma
pp. 397-401(5)
Author: Szikora, B.

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Influence of C atom concentration for acetylene production in a CH4/N2 afterglow
pp. 403-407(5)
Authors: Diamy A.-M.; Hrach, R.; Hrachova, V.; Legrand, J.

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Emission spectroscopy of Ar-H2 plasma
pp. 409-412(4)
Authors: Monna, V.; Ricard, A.

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Application of a noble gas mass spectrometric system in environmental studies
pp. 441-445(5)
Authors: Futo, I.; Molnar, M.; Palcsu, L.; Svingor, E.; Szanto, Z.

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Pressure determination in small electron tubes
pp. 465-470(6)
Authors: Nemanic, V.; umer, M.; Zajec, B.

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Vacuum sintering of water-atomised HSS powders with MoS2 additions
pp. 471-477(7)
Authors: Sustarsic, B.; Kosec, L.; Jenko, M.; Leskovsek, V.

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Nitridation of vanadium in molecular nitrogen: a comparison of rapid thermal processing (RTP) and conventional furnace annealing
pp. 479-484(6)
Authors: Galesic, I.; Reusch, U.; Angelkort, C.; Lewalter, H.; Berendes, A.; Schweda, E.; Kolbesen, B.O.

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