Skip to main content

Publisher: Elsevier

Volume 59, Number 2, November 2000

Yttria-stabilized zirconia (YSZ) heteroepitaxially grown on Si substrates by reactive sputtering
pp. 381-389(9)
Authors: Hata, T.; Sasaki, K.; Ichikawa, Y.; Sasaki, K.

Favourites:
ADD
Favourites:
ADD

Effect of substrate surface morphology and interface microstructure in ZnO thin films formed on various substrates
pp. 403-410(8)
Authors: Yoshino, Y.; Inoue, K.; Takeuchi, M.; Makino, T.; Katayama, Y.; Hata, T.

Favourites:
ADD
Favourites:
ADD

Effects of partial oxygen pressure on the crystal growth of PbTiO3 thin films on miscut (001)SrTiO3
pp. 417-423(7)
Authors: Ichikawa, Y.; Adachi, H.; Ai, R.; Wasa, K.

Favourites:
ADD

TwinMag II: Improving an advanced sputtering tool
pp. 424-430(7)
Authors: Heister, U.; Krempel-Hesse, J.; Szczyrbowski, J.; Teschner, G.; Bruch, J.; Brauer, G.

Favourites:
ADD

650mmx830mm area sputtering deposition using a separated magnet system
pp. 431-436(6)
Authors: Seino, T.; Sato, T.; Kamei, M.

Favourites:
ADD

Development of biased directional sputtering (BDS) for barrier metal formation
pp. 437-444(8)
Authors: Sato, H.; Sato, M.; Tagami, M.; Funato, K.; Sasaki, M.; Taguchi, S.; Mizuno, S.; Kobayashi, M.

Favourites:
ADD

Development of a locally electron-heated plasma source
pp. 445-450(6)
Authors: Seki, H.; Kitazawa, S.; Ueno, Y.; Wada, N.; Takemori, S.; Sato, T.; Uchikawa, S.; Setoyama, E.

Favourites:
ADD

Properties of high-density (Pb, La) (Zr, Ti) O3 ceramics for sputtering targets
pp. 451-458(8)
Authors: Hidaka, K.; Hashiguchi, S.; Nagayama, S.; Kim, P.

Favourites:
ADD

Holey-plate plasma source for plasma processing
pp. 459-465(7)
Authors: Yoshida, Y.; Ogura, H.

Favourites:
ADD

Magnetron sputtering cathode with confined magnetic flux
pp. 466-471(6)
Authors: Ai, R.; Wasa, K.; Ichikawa, Y.

Favourites:
ADD

Light-absorbing wide-band AR coatings on PET films by sputtering
pp. 479-483(5)
Authors: Oyama, T.; Yamada, T.

Favourites:
ADD

Phonon scattering in electron transport phenomena of ITO films
pp. 492-499(8)
Authors: Kikuchi, N.; Kusano, E.; Nanto, H.; Kinbara, A.; Hideo

Favourites:
ADD
Favourites:
ADD

Hydrophilic characteristics of rf-sputtered amorphous TiO2 film
pp. 506-513(8)
Authors: Nakamura, M.; Aoki, T.; Hatanaka, Y.

Favourites:
ADD

Basic characteristics of TiO2 film for environmental purification deposited by electron-beam-excited plasma
pp. 514-521(8)
Authors: Ikezawa, S.; Mutsuga, F.; Kubota, T.; Suzuki, R.; Baba, K.; Koh, S.; Yoshioka, T.; Nishiwaki, A.; Kida, K.; Ninomiya, Y.; Wakita, K.

Favourites:
ADD

Hard disk media: future problems and possible solutions
pp. 522-530(9)
Author: Lambeth, D.N.

Favourites:
ADD
Favourites:
ADD

Optimization of zinc oxide thin film for surface acoustic wave filters by radio frequency sputtering
pp. 538-545(8)
Authors: Yoshino, Y.; Makino, T.; Katayama, Y.; Hata, T.

Favourites:
ADD

Conductive transparent films deposited by simultaneous sputtering of zinc-oxide and indium-oxide targets
pp. 546-552(7)
Authors: Tominaga, K.; Murayama, T.; Mori, I.; Okamoto, T.; Hiruta, K.; Moriga, T.; Nakabayashi, I.

Favourites:
ADD

Focusing efficiency of a multilayer Fresnel zone plate for hard X-ray fabricated by DC sputtering deposition
pp. 553-558(6)
Authors: Tamura, S.; Murai, K.; Kamijo, N.; Yoshida, K.; Kihara, H.; Suzuki, Y.

Favourites:
ADD
Favourites:
ADD

Tribological properties of a-C:N and a-C films prepared by shielded arc ion plating
pp. 567-573(7)
Authors: Tajima, N.; Saze, H.; Sugimura, H.; Takai, O.

Favourites:
ADD
Favourites:
ADD

Ion fraction and energy distribution of Ti flux incident to substrate surface in RF-plasma enhanced magnetron sputtering
pp. 586-593(8)
Authors: Fukushima, K.; Kusano, E.; Kikuchi, N.; Saito, T.; Saiki, S.; Nanto, H.; Kinbara, A.

Favourites:
ADD

RF sputtering of polymers and its potential application
pp. 594-599(6)
Author: Biederman, H.

Favourites:
ADD
Favourites:
ADD

Early stages of ITO deposition on glass or polymer substrates
pp. 614-621(8)
Authors: Shigesato, Y.; Koshi-ishi, R.; Kawashima, T.; Ohsako, J.

Favourites:
ADD

Preparation of BST ferroelectric thin film by pulsed laser ablation for dielectric bolometers
pp. 628-634(7)
Authors: Xu, H.; Zhu, H.; Hashimoto, K.; Kiyomoto, T.; Mukaigawa, T.; Kubo, R.; Yoshino, Y.; Noda, M.; Suzuki, Y.; Okuyama, M.

Favourites:
ADD

Low-temperature growth of low-resistivity indium-tin-oxide thin films by pulsed laser deposition
pp. 641-648(8)
Authors: Adurodija, F.O.; Izumi, H.; Ishihara, T.; Yoshioka, H.; Matsui, H.; Motoyama, M.

Favourites:
ADD

Aluminum nitride thin films prepared by radical-assisted pulsed laser deposition
pp. 649-656(8)
Authors: Ishihara, M.; Yamamoto, K.; Kokai, F.; Koga, Y.

Favourites:
ADD

New DLC coating method using magnetron plasma in an unbalanced magnetic field
pp. 657-664(8)
Authors: Fujimaki, S.; Kashiwase, H.; Kokaku, Y.

Favourites:
ADD

Uniform deposition of SiC thin films on plastics surfaces
pp. 665-671(7)
Authors: Anma, H.; Toki, J.; Ikeda, T.; Hatanaka, Y.

Favourites:
ADD

Silicon selective growth on partially oxidized substrate by ECR plasma CVD technique
pp. 672-677(6)
Authors: Sasaki, K.; Takada, T.; Yoshida, Y.

Favourites:
ADD

Low-temperature growth and n-type doping of CdTe by the remote-plasma-assisted metalorganic chemical vapor deposition method
pp. 678-685(8)
Authors: Niraula, M.; Mochizuki, D.; Aoki, T.; Nakanishi, Y.; Hatanaka, Y.

Favourites:
ADD

Effect of microwave ferrite on the density distribution of microwave-superposed inductively coupled plasma
pp. 686-692(7)
Authors: Okuji, S.; Sakudo, N.; Hayashi, K.; Fujimura, K.; Nishiyama, Y.; Toyoda, K.; Yashima, S.; Ishida, T.

Favourites:
ADD

Dependence of metal sheet resistance on metal etch/post-etch treatment and subsequent process conditions
pp. 693-700(8)
Authors: Yoo, K.J.; Chi, S.H.; Yim, M.H.; Han, S.B.; Choi, S.J.; Ha, J.H.

Favourites:
ADD

Epitaxial growth of CdSeTe films by remote plasma enhanced metal organic chemical vapor deposition
pp. 701-707(7)
Authors: Noda, D.; Aoki, T.; Nakanishi, Y.; Hatanaka, Y.

Favourites:
ADD

Measurements of negative ion density in fluorocarbon ECR plasma
pp. 708-715(8)
Authors: Shindo, M.; Ueda, Y.; Kawakami, S.; Ishii, N.; Kawai, Y.

Favourites:
ADD

Formation process of Ni-N films by reactive sputtering at different substrate temperatures
pp. 721-726(6)
Authors: Kawamura, M.; Abe, Y.; Sasaki, K.

Favourites:
ADD

Ultrathin Al2O3 and AlN films deposited by reactive sputter using advanced electron cyclotron resonance plasma source
pp. 727-734(8)
Authors: Shimada, M.; Amazawa, T.; Ono, T.; Matsuo, S.; Oikawa, H.

Favourites:
ADD

Deposition of TiC films by dual source dc magnetron sputtering
pp. 735-741(7)
Authors: Inoue, S.; Wada, Y.; Koterazawa, K.

Favourites:
ADD

Boron nitride thin films synthesized by reactive sputtering
pp. 748-754(7)
Authors: Hu, C.; Kotake, S.; Suzuki, Y.; Senoo, M.

Favourites:
ADD

Optical and structural properties of dense SiO2, Ta2O5 and Nb2O5 thin-films deposited by indirectly reactive sputtering technique
pp. 755-763(9)
Authors: Song, Y.; Sakurai, T.; Maruta, K.; Matusita, A.; Matsumoto, S.; Saisho, S.; Kikuchi, K.

Favourites:
ADD

Effect of d.c. bias on the deposition rate using r.f.-d.c. coupled magnetron sputtering for SnNx thin films
pp. 764-770(7)
Authors: Kamei, R.; Migita, T.; Tanaka, T.; Kawabata, K.

Favourites:
ADD

Surface morphology of TiN films reactively deposited by bias sputtering
pp. 777-784(8)
Authors: Takahashi, T.; Masugata, K.; Kawai, H.; Kontani, S.; Yamamoto, J.

Favourites:
ADD
Favourites:
ADD

Sputtered silver-based low-emissivity coatings with high moisture durability
pp. 792-799(8)
Authors: Ando, E.; Suzuki, S.; Aomine, N.; Miyazaki, M.; Tada, M.

Favourites:
ADD

Effect of input power on crystal orientation and residual stress in AlN film deposited by dc sputtering
pp. 806-813(8)
Authors: Kusaka, K.; Taniguchi, D.; Hanabusa, T.; Tominaga, K.

Favourites:
ADD

Ultra-clean sputtering process for magnetic thin films on hard disk drives
pp. 814-824(11)
Authors: Takahashi, M.; Tsunoda, M.; Shoji, H.

Favourites:
ADD

Large-area production of solar absorbent multilayers by MF-pulsed plasma technology
pp. 825-835(11)
Authors: Milde, F.; Dimer, M.; Hecht, C.; Schulze, D.; Gantenbein, P.

Favourites:
ADD

TiO2-X sputter for high rate deposition of TiO2
pp. 836-843(8)
Authors: Tachibana, Y.; Ohsaki, H.; Hayashi, A.; Mitsui, A.; Hayashi, Y.

Favourites:
ADD

Access Key

Free Content
Free content
New Content
New content
Open Access Content
Open access content
Subscribed Content
Subscribed content
Free Trial Content
Free trial content
Cookie Policy
X
Cookie Policy
ingentaconnect website makes use of cookies so as to keep track of data that you have filled in. I am Happy with this Find out more