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Publisher: Elsevier

Volume 59, Number 1, October 2000

On the ISAPS '99 in Osaka
pp. 1-4(4)
Author: Kobayashi, A.

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From basic to applied plasma science
pp. 5-13(9)
Author: Y. Wong, A.

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Environmental and technical aspects of plasma nitrocarburising
pp. 14-23(10)
Authors: Bell, T.; Sun, Y.; Suhadi, A.

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Generation of high heat flux plasmas by high power rf heating in the divertor plasma simulator NAGDIS-II
pp. 24-34(11)
Authors: Uesugi, Y.; Imai, T.; Sawada, H.; Hattori, N.; Takamura, S.

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1-40kW steam respectively multi gas thermal plasma torch system
pp. 35-46(12)
Authors: Glocker, B.; Nentwig, G.; Messerschmid, E.

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High thermal efficiency-type laminar plasma jet generator for plasma processing
pp. 47-54(8)
Authors: Osaki, K.; Fukumasa, O.; Kobayashi, A.

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Application of strongly ionized AC tokamak plasma for synthesis of TiN thin films
pp. 55-62(8)
Authors: Ye, M.Y.; Matsuda, O.; Ohno, N.; Uesugi, Y.; Takagi, M.; Takamura, S.

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Continuous-wave laser thruster experiment
pp. 63-72(10)
Authors: Toyoda, K.; Komurasaki, K.; Arakawa, Y.

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A study of plasma propulsion system with RF heating
pp. 73-79(7)
Authors: Sou, H.; Takao, Y.; Noutsuka, T.; Mori, Y.; Uemura, K.; Nakashima, H.

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Emission spectrum diagnostics of argon DC discharge
pp. 80-87(8)
Authors: Zhang, J.L.; deng, X.L.; Wang, P.S.; Ma, T.C.

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Radiation power emitted from Ar torch short plasma as a function of in-put power in several kW
pp. 88-97(10)
Authors: Iwao, T.; Miyazaki, H.; Hayashi, T.; Hirano, T.; Inaba, T.

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Very low-power arcjet testing
pp. 106-117(12)
Authors: Horisawa, H.; Kimura, I.

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An attempt to develop relations for the arc voltage in relation to the arc current and gas flow rate
pp. 118-125(8)
Authors: Ramasamy, R.; Selvarajan, V.; Perumal, K.; Shanmugavelayutham, G.

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The charged dust in processing plasma sheath
pp. 126-134(9)
Authors: Liu, J.Y.; Wang, D.; Ma, T.C.

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Micro-arc discharge phenomena
pp. 142-151(10)
Authors: Hirata, Y.; Fukushima, M.; Sano, T.; Ozaki, K.; Ohji, T.

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Deposition of 3C-SiC films using ECR plasma of methylsilane
pp. 152-158(7)
Authors: Matsutani, T.; Kiuchi, M.; Takeuchi, T.; Matsumoto, T.; Mimoto, K.; Goto, S.

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Preparation of metal nitride and oxide thin films using shielded reactive vacuum arc deposition
pp. 159-167(9)
Authors: Miyano, R.; Kimura, K.; Izumi, K.; Takikawa, H.; Sakakibara, T.

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Modeling plasma processes in microelectronics
pp. 168-178(11)
Authors: Richards, D.F.; Bloomfield, M.O.; Soukane, S.; Cale, T.S.

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Active electronic devices fabricated by DC plasma arc spray process
pp. 179-184(6)
Authors: Dickey, H.C.; Meek, T.T.

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Development of composite thermal barrier coatings with anisotropic microstructure
pp. 185-193(9)
Authors: Sharafat, S.; Kobayashi, A.; Ogden, V.; Ghoniem, N.M.

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Development of electromagnetic acceleration plasma generator for titanium nitride coatings
pp. 203-209(7)
Authors: Shibata, T.; Tahara, H.; Yasui, T.; Kagaya, Y.; Yoshikawa, T.

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CxFy polymer film deposition in DC and RF fluorinert vapor plasmas
pp. 210-219(10)
Authors: Lungu, C.P.; Lungu, A.M.; Sakai, Y.; Sugawara, H.; Tabata, M.; Akazawa, M.; Miyamoto, M.

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NOx treatment by positive streamer corona
pp. 220-227(8)
Authors: Gasparik, R.; Mine, N.; Ihara, S.; Satoh, S.; Yamabe, C.

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Treatment of NOx in exhaust gas by corona plasma over water surface
pp. 228-235(8)
Authors: Fujii, T.; Rea, M.

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Spectroscopic measurements of discharges inside bubbles in water
pp. 236-243(8)
Authors: Miichi, T.; Ihara, S.; Satoh, S.; Yamabe, C.

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Plasma in-flight treatment of electroplating sludge
pp. 244-251(8)
Authors: Ramachandran, K.; Kikukawa, N.

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Formation and physical properties of Al base alloys by sputtering
pp. 252-259(8)
Authors: Naka, M.; Shibayanagi, T.; Maeda, M.; Zhao, S.; Mori, H.

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Synthesis of Fe-N gradient foil by nitrogen plasma
pp. 260-265(6)
Authors: Niizuma, K.; Utsushikawa, Y.

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High-density microwave plasma for high-rate and low-temperature deposition of silicon thin film
pp. 266-276(11)
Authors: Sakuma, Y.; Haiping, L.; Ueyama, H.; Shirai, H.

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Effects of sputter-deposited materials (W, Ti and SiC) on interfacial reaction between MoSi2 and Nb
pp. 284-291(8)
Authors: Kurokawa, K.; Ochiai, G.; Takahashi, H.; Ohta, S.; Takahashi, H.

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Study on smoothing of titanium surface by intense pulsed ion beam irradiation
pp. 313-320(8)
Authors: Hashimoto, Y.; Yatsuzuka, M.

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Pinhole defect evaluation of TiN films prepared by dry coating process
pp. 321-329(9)
Authors: Uchida, H.; Yamashita, M.

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Enhanced corrosion resistance of TiN prepared by plasma-based ion implantation
pp. 330-337(8)
Authors: Yatsuzuka, M.; Miki, S.; Morita, R.; Azuma, K.; Fujiwara, E.; Uchida, H.

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Application of atomic absorption spectrometry to laser plume analysis
pp. 338-348(11)
Authors: Han, X.; Futamata, M.

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Laser oscillation using an inductive energy storage pulsed-power generator with plasma opening switch
pp. 349-357(9)
Authors: Kamatani, M.; Ihara, S.; Satoh, S.; Yamabe, C.

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A simple electron gun by obstructed discharge and its discharge-sustaining mechanism
pp. 358-372(15)
Authors: Fukao, M.; Ishida, M.; Ohtsuka, Y.; Matsuo, H.

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Formation of WC-Co layers by an electron beam cladding method and evaluation of the layer properties
pp. 373-380(8)
Authors: Abe, N.; Morimoto, J.; Tomie, M.; Doi, C.

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