Analysis of the negative ion characteristics of O2 supermagnetron plasma for submicron etching use - Appl Phys

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Keywords: Negative ion; Plasma etching; Self-bias voltage; Supermagnetron plasma

Document Type: Research Article

DOI: http://dx.doi.org/10.1016/S0042-207X(99)00154-2

Affiliations: aResearch Institute of Electronics, Shizuoka University, 3-5-1 Johoku, Hamamatsu, Japan

Publication date: December 1, 1999

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