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Reactive ion etching of quartz and silica-based glasses in CF4/CHF3 plasmas

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Document Type: Research Article

DOI: http://dx.doi.org/10.1016/S0042-207X(99)00146-3

Affiliations: C.S.I.R.O Division of Manufacturing Science and Technology, Private Bag 33, Clayton South, 3169, Victoria, Australia

Publication date: December 1, 1999

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