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Publisher: Elsevier

Volume 55, Number 3, 1 December 1999

Nanometer scale multilayered hard coatings
pp. 179-190(12)
Authors: Yashar, P.C.; Sproul, W.D.

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Improvement of thin film transformer characteristics by use of a new fabrication process
pp. 197-200(4)
Authors: Zhang, H.W.; Zhong, Z.Y.; Liu, Y.L.; Wang, H.C.

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Dark C-V and I-V characteristics of silicon multi-junctions prepared by liquid-phase epitaxy
pp. 201-206(6)
Authors: Metwally, H.S.; Ashery, A.; Terra, F.S.; El-Shazly, A.A.

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Non-destructive characterization of ion-implanted diamond
pp. 207-217(11)
Authors: Ma, Z.Q.; Liu, B.X.; Naramoto, H.; Aoki, Y.; Yamamoto, S.; Takeshita, H.; Goppelt-Langer, P.C.

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Analysis of the negative ion characteristics of O2 supermagnetron plasma for submicron etching use - Appl Phys
pp. 219-222(4)
Authors: Kinoshita, H.; Honda, M.; Tatsuta, T.; Sakiya, F.

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Emittance of high-power-density electron beam
pp. 223-233(11)
Author: Felba, J.

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Growth defects associated with MBE deposited GaAs layers
pp. 249-253(5)
Authors: Kadhim, N.J.; Mukherjee, D.

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