A low-energy ion beam system for studying energetic ion deposition on Silicon surfaces

Author: Shoji F.1

Source: Vacuum, Volume 53, Number 3, June 1999 , pp. 459-464(6)

Publisher: Elsevier

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Keywords: Low-energy ion beam deposition; Metal ion source; Low-energy ion scattering

Language: English

Document Type: Research article

DOI: 10.1016/S0042-207X(99)00113-X

Affiliations: 1: Department of Electrical Engineering, Faculty of Engineering, Kyushu Kyoritsu University, Yahata-nishi, Kita-kyushu, Fukuoka, Japan

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