Publisher: Elsevier

Related content
Volume 51, Number 3, 1 November 1998

< previous issue | all issues | next issue >

Favourites:Add to Favourites

High crystalline quality titanium disilicides formed by sputter deposition of Ti?Si multilayers and annealing
pp. 335-337(3)
Authors: Revva, P.; Kastanas, A.; Travlos, A.; Nassiopoulou, A.G.

Favourites:Add to Favourites

Experimental investigation of weld pool formation in electron beam welding
pp. 339-343(5)
Authors: Petrov, P.; Georgiev, C.; Petrov, G.

Favourites:Add to Favourites

Ionization of clusters produced in a hollow-cathode source
pp. 357-362(6)
Authors: Xenoulis, A.C.; Doukellis, G.; Tsouris, P.; Karydas, A.; Potiriadis, C.; Katsanos, A.A.; Tsakalakos, T.

Favourites:Add to Favourites

Roughness and deposition mechanism of DLC films prepared by r.f. plasma glow discharge
pp. 363-368(6)
Authors: Ali, A.; Hirakuri, K.K.; Friedbacher, G.

Favourites:Add to Favourites
Favourites:Add to Favourites

Characterization of TiN films prepared by rf sputtering using metal and compound targets
pp. 377-380(4)
Authors: Kawamura, M.; Kumagai, K.; Abe, Y.; Sasaki, K.; Yanagisawa, H.

Favourites:Add to Favourites

X-ray profile analysis on dislocations and hardness of Copper films
pp. 381-383(3)
Authors: Shan, F.L.; Wang, Y.M.

Favourites:Add to Favourites

Influence of microwave plasma parameters on the nitriding of T-304 stainless steel
pp. 385-392(8)
Authors: Camps, E.; Muhl, S.; Romero, S.

Favourites:Add to Favourites

Charge state of alkali atoms scattered by Mo and W surfaces
pp. 393-396(4)
Authors: Aliev, A.A.; Makhmudov, O.A.

Favourites:Add to Favourites

A study of the interface of CeO2?Si heterostructure grown by ion beam deposition
pp. 397-401(5)
Authors: Wu, Z.; Huang, D.; Yang, X.

Favourites:Add to Favourites

Calculation of sputtering yields under high-fluence bombardment of a CuxNi1-x alloy
pp. 413-416(4)
Authors: Zheng L.-P.; Li, R.; Chinap; Li, M.

Favourites:Add to Favourites

Characterisation of DC unbalanced magnetron deposition of Ni?C : H composite films
pp. 417-426(10)
Authors: Zeuner, M.; Neumann, H.; Zalman, J.; Slavinska, D.; Biederman, H.

Favourites:Add to Favourites
Favourites:Add to Favourites

Amorphous carbon film deposition using a DC-biased screen-grid in an electron cyclotron resonance plasma
pp. 445-451(7)
Authors: Yoon, S.F.; Ruslie; Ahn, J.; Zhang, Q.; Wu, Y.S.; Yang, H.

Favourites:Add to Favourites

Photodarkening in amorphous GeSnSe4Cu0.5 films
pp. 453-455(3)
Author: Sedeek, K.

Favourites:Add to Favourites

Microwave near-field plasma probe
pp. 463-468(6)
Author: Law, V.J.

Favourites:Add to Favourites

Share Content

Access Key

Free Content
Free content
New Content
New content
Open Access Content
Open access content
Subscribed Content
Subscribed content
Free Trial Content
Free trial content
Cookie Policy
X
Cookie Policy
ingentaconnect website makes use of cookies so as to keep track of data that you have filled in. I am Happy with this Find out more