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Characterization of nitrogen-doped amorphous silicon carbide thin films

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Document Type: Research Article

DOI: http://dx.doi.org/10.1016/S0042-207X(98)00151-1

Affiliations: Institute of Electrical Engineering Slovak Academy of Sciences Dubravskacesta 9 842 39, Bratislava, Slovakia

Publication date: October 1, 1998

els/0042207x/1998/00000051/00000002/art00151
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