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Publisher: Elsevier

Volume 49, Number 3, March 1998

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Vaporization studies of oxide systems using a QMS-420 mass spectrometer
pp. 161-165(5)
Authors: Stolyarova, V.L.; Seetharaman, S.

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Temperature dependent XPS study of CO dissociation on small Rh particles
pp. 167-170(4)
Authors: Sandell, A.; Frank, M.; Libuda, J.; Baumer, M.; Freund, H.; Andersson, S.; Brena, B.; Giertz, A.; Bruhwiler, P.A.; Martensson, N.

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Adsorption of SO2 on Cu(100) and Cu(100)-c(2 x 2)-O surfaces studied with photoelectron spectroscopy
pp. 171-174(4)
Authors: Pradier, C.M.; Lu, H.; Janin, E.; Davila, M.E.; Gothelid, M.

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STM and photoelectron spectroscopy studies of silicon-cerium dioxide interface formation
pp. 175-179(5)
Authors: Rad, M.G.; Hirschauer, B.; Gothelid, M.; Karlsson, U.O.

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Theoretical investigation of soft x-ray emission from a Si(100) layer buried in GaAs
pp. 181-184(4)
Authors: Karlsson, K.; Mankefors, S.; Kanski, J.; Nilsson, P.O.

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Growth of strained Si/Si1-yCy/Si1-xGex structures by MBE
pp. 185-188(4)
Authors: Joelsson, K.B.; Ni, W.; Pozina, G.; Hultman, L.; Hansson, G.V.

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Growth of highly (0001)-oriented aluminum nitride thin films with smooth surfaces on silicon carbide by gas-source molecular beam epitaxy
pp. 189-191(3)
Authors: Kern, R.S.; Smith, S.A.; Jarrendahl, K.; Zheleva, T.; Davis, R.F.

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Study of reactive DC magnetron sputtering deposition of AlN thin films
pp. 193-197(5)
Authors: dechev, D.A.; Dimitrova, V.I.; Manova, D.I.

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Fluorescence of plasma polymer films with embedded dye molecules
pp. 205-211(7)
Authors: Homilius, F.; Heilmann, A.; Rempel, U.; von Borczyskowski, C.

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Optical emission end point detecting for monitoring oxygen plasma a-C:H stripping
pp. 213-215(3)
Authors: Cescato, L.; Alves, M.A.R.; Da Silva Braga, E.; Fissore, A.

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Ultraviolet fluorescence microwave plasma probe
pp. 217-220(4)
Author: Law, V.J.

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Study of the processes occurring when sputtering YBa2Cu3O7-x in pure oxygen
pp. 221-225(5)
Authors: Nathan, S.S.; Muralidhar, G.K.; Rao, G.M.; Mohan, S.

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Nature and dynamics of the O-Pd(110) surface bonding
pp. 227-232(6)
Author: Sun, C.Q.

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Outgassing of a thin wall vacuum insulating panel
pp. 233-237(5)
Authors: Setina, J.; NemaniC, V.

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Electron beam hardening of ion nitrided layers
pp. 239-246(8)
Authors: Petrov, P.; Valkanov, S.; Dimitrov, D.; Aprakova, M.

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Magnetron sputtering system stabilisation for high rate deposition of AlN films
pp. 247-251(5)
Authors: Akhmatov, V.; Fomin, A.A.; Selishchev, S.V.

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