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Publisher: Elsevier

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Volume 47, Number 5, May 1996

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The unimolecular decays of Aln+/- and Cun+/- sputtered clusters: A comparison between competitive decay modes
pp. 405-407(3)
Authors: Bekkerman, A.D.; Dzhemilev, N.K.; Verkhoturov, S.V.; Veryovkin, I.V.

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Preferential sputtering and surface binding energy in metal silicides
pp. 421-424(4)
Authors: Zaporozchenko, V.I.; Vojtusik, S.S.; Stepanova, M.G.

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The effect of nitrogen content on the structure and mechanical properties of TiN films produced by magnetron sputtering
pp. 425-431(7)
Authors: Arnell, R.D.; Colligon, J.S.; Minnebaev, K.F.; Yurasova, V.E.

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Energy dependence of the proton-induced convoy electron yield
pp. 433-436(4)
Authors: Kerkow, H.; Gelfort, S.; Stolle, R.; Petukhov, V.P.; Romanovski, E.A.

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Damage to Si substrates during SiO2 etching: Opportunities of subsequent removal by optimized cleaning procedures
pp. 437-443(7)
Authors: Richter, H.H.; Wolff, A.; Blum, K.; Hoeppner, K.; Kruger, D.; Sorge, R.

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Properties of ultrathin silver layers deposited on the Cu(001) face
pp. 445-449(5)
Authors: Nowicki, M.; Mroz, S.

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Focused ion beam preparation of inclined planes in semiconductor materials
pp. 451-454(4)
Authors: Khamsehpour, B.; Davies, S.T.

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Focused ion beam machining and deposition for nanofabrication
pp. 455-462(8)
Authors: Davies, S.T.; Khamsehpour, B.

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Intermetallic generators of alkali metal with a seal
pp. 463-466(4)
Authors: Chuntonov, K.A.; Mansurov, V.V.

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