Publisher: Elsevier

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Volume 46, Number 11, November 1995

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Precursor design and selective aluminum CVD
pp. 1249-1253(5)
Authors: Tsubouchi, K.; Masu, K.

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ZnSe films: Preparation and properties
pp. 1255-1260(6)
Authors: Pal, R.; Maiti, B.; Chaudhuri, S.; Pal, A.K.

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Localization of the constituent depth profile near Al-Sn alloy surface
pp. 1271-1273(3)
Authors: Zhenxia, W.; Jishen, P.; Jiping, Z.; Wenmin, W.

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Sputter deposition of decorative boride coatings
pp. 1281-1294(14)
Authors: Mitterer, C.; Komenda-Stallmaier, J.; Losbichler, P.; Schmolz, P.; Werner, W.S.M.; Stori, H.

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The temperature dependence of the electrical resistivity of Al-Zn alloy thin films
pp. 1299-1303(5)
Authors: El-Salam, F.A.; Ibraheim, A.M.; Ammar, A.H.; Morsy, A.Y.

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Range distribution of implanted 19F ions in titanium
pp. 1311-1313(3)
Authors: Tan, C.; Xia, Y.; Liu, J.; Liu, X.; Yang, H.; Sun, X.; Wang, F.

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A new simple technique to obtain In2Se3 polycrystalline thin films
pp. 1315-1323(9)
Authors: Marsillac, S.; Bernede, J.C.; Le Ny, R.; Conan, A.

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Experimental and simulated XPS depth profiles of low-energy high dose nitrogen implanted into aluminium
pp. 1333-1335(3)
Authors: Sullivan, J.L.; Saied, S.O.; Wronski, Z.; Sielanko, J.

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A general model for vacuum condensates and vacuum diffusive coatings
pp. 1337-1346(10)
Authors: Shishkov, R.I.; Lisichkova, E.M.

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Kinetics of solid-phase interactions in thin-film Cu/Ti system with an excess of Ti
pp. 1347-1350(4)
Authors: Uzunov, T.D.; Lambov, S.I.; Stojanov, S.P.

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