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The effect of self-ions bombardment on the structure and properties of thin metal films

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Document Type: Research Article

DOI: http://dx.doi.org/10.1016/0042-207X(94)00148-0

Affiliations: Institute of Microelectronics Technology and High Purity Materials, Russian Academy of Sciences, Chernogolovka 142432, Moscow Dist., Russian Federation

Publication date: July 1, 1995

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